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    Journals >Laser & Optoelectronics Progress >Volume 59 >Issue 9 >Page 0922001 > Article
    • Laser & Optoelectronics Progress
    • Vol. 59, Issue 9, 0922001 (2022)
    Computational Lithography Technology Under Chip Manufacture Context
    Weijie Shi1、*, Zongqiang Yu1, Junhai Jiang1, Yongqiang Che2, and Sikun Li3
    Author Affiliations
  • 1Dongfang Jingyuan Electronic Technology (Beijing) Co., Ltd., Beijing 100176China
  • 2Semiconductor Manufacturing North China (Beijing) Corporation, Beijing 100176, China
  • 3Laboratory of Information Optics and Opto‐Electronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
    • show less
    DOI: 10.3788/LOP202259.0922001 Cite this Article Set citation alerts
    Weijie Shi, Zongqiang Yu, Junhai Jiang, Yongqiang Che, Sikun Li. Computational Lithography Technology Under Chip Manufacture Context[J]. Laser & Optoelectronics Progress, 2022, 59(9): 0922001 Copy Citation Text show less
    References

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    Weijie Shi, Zongqiang Yu, Junhai Jiang, Yongqiang Che, Sikun Li. Computational Lithography Technology Under Chip Manufacture Context[J]. Laser & Optoelectronics Progress, 2022, 59(9): 0922001
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