Computational lithography technology plays crucial roles in enhancing resolution. It bridges the gap between chip design and manufacturing processes. In this study, first, rule-based optical proximity correction (OPC) was introduced as the first generation of OPC and the origin of computational lithography. Second, model-based OPC, source mask cooperation, and double patterning technology were introduced under the 14-nm IC manufacturing context. Finally, the trend of computational lithography was discussed and inverse lithography technology, curvilinear masks, AI-based OPCs, and holistic process optimizations were introduced. Integrated optimization of chip design, manufacturing and inspection offers broad prospects for computational lithography.