Computational Lithography Technology Under Chip Manufacture Context

Weijie Shi; Zongqiang Yu; Junhai Jiang; Yongqiang Che; Sikun Li

doi:10.3788/LOP202259.0922001

Journals >Laser & Optoelectronics Progress >Volume 59 >Issue 9 >Page 0922001 > Article

Laser & Optoelectronics Progress
Vol. 59, Issue 9, 0922001 (2022)

Computational Lithography Technology Under Chip Manufacture Context

Weijie Shi^1、*, Zongqiang Yu¹, Junhai Jiang¹, Yongqiang Che², and Sikun Li³

Author Affiliations

¹Dongfang Jingyuan Electronic Technology (Beijing) Co., Ltd., Beijing 100176China

²Semiconductor Manufacturing North China (Beijing) Corporation, Beijing 100176, China

³Laboratory of Information Optics and Opto‐Electronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

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DOI: 10.3788/LOP202259.0922001 Cite this Article Set citation alerts

Weijie Shi, Zongqiang Yu, Junhai Jiang, Yongqiang Che, Sikun Li. Computational Lithography Technology Under Chip Manufacture Context[J]. Laser & Optoelectronics Progress, 2022, 59(9): 0922001 Copy Citation Text

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Weijie Shi, Zongqiang Yu, Junhai Jiang, Yongqiang Che, Sikun Li. Computational Lithography Technology Under Chip Manufacture Context[J]. Laser & Optoelectronics Progress, 2022, 59(9): 0922001

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