[1] Moore G E. The future of integrated electronics[EB/OL]. https://www.computerhistory.org/collections/catalog/102770836
[2] Rayleigh J W S[M]. The theory of sound(1945).
[3] Li Y Q. Lithography tool evolution and the trend of its development[J]. Microfabrication Technology, 1-5, 11(2003).
[4] Lou Q H, Yuan Z J, Zhang H B. The history and current status of lithography[J]. Science, 69, 32-36(2017).
[5] Blumenstock G M, Meinert C, Farrar N R et al. Evolution of light source technology to support immersion and EUV lithography[J]. Proceedings of SPIE, 5645, 188-195(2005).
[6] Levinson H J[M]. Principles of lithography(2005).
[7] Lin B J. The future of subhalf-micrometer optical lithography[J]. Microelectronic Engineering, 6, 31-51(1987).
[8] van Schoot J, Troost K, Bornebroek F et al. High-NA EUV lithography enabling Moore’s law in the next decade[J]. Proceedings of SPIE, 10450, 104500U(2017).
[9] Fomenkov I. EUV source for lithography in HVM: performance and prospects[EB/OL]. https://www.euvlitho.com/2019/S1.pdf
[10] Brandt D C, Fomenkov I V, Graham M. Performance and availability of EUV sources in high volume manufacturing on multiple nodes in the field and advances in source power[J]. Proceedings of SPIE, 11854, 118540J(2021).
[11] Kong J. Netherlands ASML bid $2.6 billion for Cymer[EB/OL]. https://finance.qq.com/a/20121017/006391.htm
[12] ASML. EUV Lithography Systems TWINSCAN NXE 3600D[EB/OL]. https://www.asml.com/en/products/euv-lithography-systems/twinscan-nxe-3600d
[13] Mizoguchi H, Tomuro H, Nishimura Y et al. Update of >300 W high power LPP-EUV source challenge IV for semiconductor HVM[J]. Proceedings of SPIE, 11854, 118540K(2021).
[14] Mainfray G, Manus G. Multiphoton ionization of atoms[J]. Reports on Progress in Physics, 54, 1333-1372(1991).
[15] Johnston T W, Dawson J M. Correct values for high-frequency power absorption by inverse bremsstrahlung in plasmas[J]. The Physics of Fluids, 16, 722(1973).
[16] Wannier G H[M]. Statistical physics, 197-203(1987).
[17] Nishimura H, Fujioka S, Shimomura M et al. Development of extreme-ultraviolet light source by laser-produced plasma[J]. The Review of Laser Engineering, 36, 1125-1128(2008).
[18] Brandt D C, Fomenkov I V, Ershov A I et al. LPP source system development for HVM[J]. Proceedings of SPIE, 7271, 40-49(2009).
[19] Fomenkov I. EUV source for lithography: readiness for HVM and outlook for increase in power and availability[EB/OL]. https://www.euvlitho.com/2018/S1.pdf
[20] Rollinger B. Droplet target for laser-produced plasma light sources[D](2012).
[21] Poirier M, Blenski T, de Gaufridy de Dortan F et al. Modeling of EUV emission from xenon and tin plasma sources for nanolithography[J]. Journal of Quantitative Spectroscopy and Radiative Transfer, 99, 482-492(2006).
[22] van de Kerkhof M A, Liu F, Meeuwissen M et al. Spectral purity performance of high-power EUV systems[J]. Proceedings of SPIE, 11323, 1132321(2020).
[23] Mizoguchi H, Nakarai H, Abe T et al. High power LPP-EUV source with long collector mirror lifetime for high volume semiconductor manufacturing[C], 17805561(2018).
[24] Brandt D C, Purvis M, Fomenkov I et al. Advances toward high power EUV sources for EUVL scanners for HVM in the next decade and beyond[J]. Proceedings of SPIE, 11609, 116091E(2021).
[25] Bakshi V[M]. EUV lithography(2018).
[26] Aota T, Nakai Y, Fujioka S et al. Characterization of extreme ultraviolet emission from tin-droplets irradiated with Nd∶YAG laser plasmas[J]. Journal of Physics: Conference Series, 112, 042064(2008).
[27] Ando T, Fujioka S, Nishimura H et al. Optimum laser pulse duration for efficient extreme ultraviolet light generation from laser-produced tin plasmas[J]. Applied Physics Letters, 89, 151501(2006).
[28] Harilal S S, Tillack M S, Tao Y et al. Extreme-ultraviolet spectral purity and magnetic ion debris mitigation by use of low-density tin targets[J]. Optics Letters, 31, 1549-1551(2006).
[29] Banine V Y, Koshelev K N, Swinkels G M. Physical processes in EUV sources for microlithography[J]. Journal of Physics D: Applied Physics, 44, 253001(2011).
[30] Zong N, Hu W M, Wang Z M et al. Research progress on laser-produced plasma light source for 13.5 nm extreme ultraviolet lithography[J]. Chinese Optics, 13, 28-42(2020).
[31] Wu H P. Evaluation and applied analysis of laser beam quality[J]. Optics and Precision Engineering, 8, 128-132(2000).
[32] Endo A, Abe T, Hoshino H et al. CO2 laser-produced Sn plasma as the solution for high-volume manufacturing EUV lithography[J]. Proceedings of SPIE, 6703, 55-62(2007).
[33] Endo A, Komori H, Ueno Y et al. Laser-produced plasma source development for EUV lithography[C], 7271, 86-92(2009).
[34] Niimi G, Nagai S, Hori T et al. Update of development progress of the high power LPP-EUV light source using a magnetic field[J]. Proceedings of SPIE, 11323, 1132328(2020).
[35] Michael P. An introduction to EUV sources for lithography[EB/OL], 2020-1. https://strobe.colorado.edu/wp-content/uploads/STROBE_
[36] Yang Z H. Electric-optically Q-switched and cavity-dumped RF waveguide CO2 laser[D](2005).
[37] Zhou D D, Yin X L, Wang Y et al. High-efficiency electro-optical cavity-dumped Q-switched laser pumped by LD at 914 nm[J]. Chinese Journal of Lasers, 45, 0101014(2018).
[38] Zhang R R. Study on technology of short pulse CO2 laser amplification and noise isolation[D]. Changchun: Changchun Institute of Optics, Fine Mechanics and Physics(2021).
[39] Nowak K, Ohta T, Suganuma T et al. CO2 laser drives extreme ultraviolet nano-lithography: second life of mature laser technology[J]. Opto-Electronics Review, 21, 345-354(2013).
[40] Mizoguchi H, Nakarai H, Abe T et al. Performance of one hundred watt HVM LPP-EUV source[J]. Proceedings of SPIE, 9422, 94220C(2015).
[41] Zhang Z H. Numerical and experimental study of high power acousto-optically Q-switched CO2 laser[D](2017).
[42] Hu Z. Study on the gain properties of fast axial flow CO2 laser amplifier[D](2015).
[43] Yi X Y. Research of CO2 laser MOPA system[D](2013).
[44] Huang H Y. The simulation and optimization of the gas flow field and heat exchanging of the high power fast axial flow CO2 laser[D](2011).
[45] Polyanskiy M N, Babzien M, Pogorelsky I V. Chirped-pulse amplification in a CO2 laser[J]. Optica, 2, 675-681(2015).
[46] Feldman B J. Multiline short pulse amplification and compression in high gain CO2 laser amplifiers[J]. Optics Communications, 14, 13-16(1975).
[47] Baeva M G, Atanasov P A. Numerical investigation of CW CO2 laser with a fast turbulent flow[J]. Journal of Physics D: Applied Physics, 26, 546-551(1993).
[48] Muller S, Uhlenbusch J. Influence of turbulence and convection on the output of a high-power CO2 laser with a fast axial flow[J]. Journal of Physics D: Applied Physics, 20, 697-708(1987).
[49] Park D, Jeong J, Yu T J. Optimization of the pulse width and injection time in a double-pass laser amplifier[J]. High Power Laser Science and Engineering, 6, e60(2018).
[50] Jeong J, Cho S, Yu T J. Numerical extension of Frantz-Nodvik equation for double-pass amplifiers with pulse overlap[J]. Optics Express, 25, 3946-3953(2017).
[51] Frantz L M, Nodvik J S. Theory of pulse propagation in a laser amplifier[J]. Journal of Applied Physics, 34, 2346-2349(1963).
[52] Brunet H. Saturation of infrared absorption in SF6[J]. IEEE Journal of Quantum Electronics, 6, 678-684(1970).
[53] Huang P, Houver S, Berger C et al. Saturable absorption in multilayer epitaxial graphene driven by mid-infrared quantum cascade lasers[C], 17259274(2017).
[54] Hercher M. An analysis of saturable absorbers[J]. Applied Optics, 6, 947-954(1967).
[55] He J L, Hou W, Zhang H L et al. 8.8 W green laser by intracavity frequency doubling of a LD pumped Nd∶YVO4 laser[J]. Chinese Journal of Lasers, 27, 481-484(2000).
[56] Schriever G, Mager S, Naweed A et al. Laser-produced lithium plasma as a narrow-band extended ultraviolet radiation source for photoelectron spectroscopy[J]. Applied Optics, 37, 1243-1248(1998).
[57] Nagano A, Inoue T, Nica P E et al. Extreme ultraviolet source using a forced recombination process in lithium plasma generated by a pulsed laser[J]. Applied Physics Letters, 90, 151502(2007).
[58] Chen H. Studies on characteristics of ion debris and extreme ultraviolet emission in laser produced tin droplet plasma[D](2015).
[59] Rajyaguru C, Higashiguchi T, Koga M et al. Parametric optimization of a narrow-band 13.5-nm emission from a Li-based liquid-jet target using dual nano-second laser pulses[J]. Applied Physics B, 80, 409-412(2005).
[60] Higashiguchi T, Kawasaki K, Sasaki W et al. Enhancement of extreme ultraviolet emission from a lithium plasma by use of dual laser pulses[J]. Applied Physics Letters, 88, 161502(2006).
[61] Shen Y F, Gao C, Zeng J L. A theoretical study of EUV emission spectra of Xe10+ ions[J]. Journal of Atomic and Molecular Physics, 24, 36-38(2007).
[62] Ueno Y, Ariga T, Soumagne G et al. Efficient extreme ultraviolet plasma source generated by a CO2 laser and a liquid xenon microjet target[J]. Applied Physics Letters, 90, 191503(2007).
[63] Sasaki A, Nishihara K, Murakami M et al. Effect of the satellite lines and opacity on the extreme ultraviolet emission from high-density Xe plasmas[J]. Applied Physics Letters, 85, 5857-5859(2004).
[64] Kalmykov S G, Butorin P S, Sasin M E. Xe laser-plasma EUV radiation source with a wavelength near 11 nm: optimization and conversion efficiency[J]. Journal of Applied Physics, 126, 103301(2019).
[65] White J, Hayden P, Dunne P et al. Simplified modeling of 13.5 nm unresolved transition array emission of a Sn plasma and comparison with experiment[J]. Journal of Applied Physics, 98, 113301(2005).
[66] Tomie T, Aota T, Ueno Y et al. Use of tin as a plasma source material for high conversion efficiency[J]. Proceedings of SPIE, 5037, 147-155(2003).
[67] Tao Y, Nishimura H, Okuno T et al. Dynamic imaging of 13.5 nm extreme ultraviolet emission from laser-produced Sn plasmas[J]. Applied Physics Letters, 87, 241502(2005).
[68] Harilal S S, Sizyuk T, Sizyuk V et al. Efficient laser-produced plasma extreme ultraviolet sources using grooved Sn targets[J]. Applied Physics Letters, 96, 111503(2010).
[69] Cummins T, O’Gorman C, Dunne P et al. Colliding laser-produced plasmas as targets for laser-generated extreme ultraviolet sources[J]. Applied Physics Letters, 105, 044101(2014).
[70] Fomenkov I. EUV source for high volume manufacturing: performance at 250 W and key technologies for power scaling[EB/OL]. https://www.euvlitho.com/2017/S1.pdf
[71] Brandt D C, Fomenkov I V, Farrar N R et al. CO2/Sn LPP EUV sources for device development and HVM[J]. Proceedings of SPIE, 8679, 396-403(2013).
[72] Hu L, She L, Fang Y S et al. Deformation characteristics of droplet generated by Rayleigh jet breakup[J]. AIP Advances, 11, 045310(2021).
[73] Cordero M L, Gallaire F, Baroud C N. Quantitative analysis of the dripping and jetting regimes in co-flowing capillary jets[J]. Physics of Fluids, 23, 094111(2011).
[74] Dong H M, Carr W W, Morris J F. An experimental study of drop-on-demand drop formation[J]. Physics of Fluids, 18, 072102(2006).
[75] Furbank R J, Morris J F. An experimental study of particle effects on drop formation[J]. Physics of Fluids, 16, 1777-1790(2004).
[76] Frohn A, Roth N[M]. Dynamics of droplets, 63-83(2000).
[77] Vinokhodov A, Krivokorytov M, Sidelnikov Y et al. Stable droplet generator for a high brightness laser produced plasma extreme ultraviolet source[J]. The Review of Scientific Instruments, 87, 103304(2016).
[78] Hudgins D. Advanced irradiation schemes for target shaping in droplet-based laser-produced plasma light sources[D](2019).
[79] Pirati A, Peeters R, Smith D et al. EUV lithography performance for manufacturing: status and outlook[J]. Proceedings of SPIE, 9776, 97760A(2016).
[80] Brandstätter M, Weber M M, Abhari R S. Non-axisymmetric droplet irradiation effects on ion and extreme ultraviolet light emission of laser-produced plasma light sources[J]. Journal of Applied Physics, 129, 233306(2021).
[81] Wu W J. The study of extreme ultraviolet and soft X-ray narrowband multilayers[D](2007).
[82] DuMond J, Youtz J P. An X-ray method of determining rates of diffusion in the solid state[J]. Journal of Applied Physics, 11, 357-365(1940).
[83] Spiller E. Low-loss reflection coatings using absorbing materials[J]. Applied Physics Letters, 20, 365-367(1972).
[84] Underwood J H, Barbee T W. Soft X-ray imaging with a normal incidence mirror[J]. Nature, 294, 429-431(1981).
[85] Louis E, Yakshin A E, Tsarfati T et al. Nanometer interface and materials control for multilayer EUV-optical applications[J]. Progress in Surface Science, 86, 255-294(2011).
[86] Stearns D G, Rosen R S, Vernon S P. High-performance multilayer mirrors for soft X-ray projection lithography[J]. Proceedings of SPIE, 1547, 2-13(1992).
[87] Yan P Y, Spiller E, Mirkarimi P. Characterization of ruthenium thin films as capping layer for extreme ultraviolet lithography mask blanks[J]. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 25, 1859-1866(2007).
[88] Stuik R, Louis E, Yakshin A E et al. Peak and integrated reflectivity, wavelength and gamma optimization of Mo/Si, and Mo/Be multilayer, multielement optics for extreme ultraviolet lithography[J]. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 17, 2998-3002(1999).
[89] Frank F C, van der Merwe J H. One-dimensional dislocations. I. static theory[J]. Proceedings of the Royal Society of London Series A Mathematical and Physical Sciences, 198, 205-216(1949).
[90] Stranski I N, Krastanow L. Zur theorie der orientierten ausscheidung von ionenkristallen aufeinander[J]. Monatshefte Für Chemie Und Verwandte Teile Anderer Wissenschaften, 71, 351-364(1937).
[91] Ohering M[M]. Materials science of thin films: deposition and structure(2002).
[92] Schwoebel R L, Shipsey E J. Step motion on crystal surfaces[J]. Journal of Applied Physics, 37, 3682-3686(1966).
[93] Louis E, Voorma H J, Koster N B et al. Enhancement of reflectivity of multilayer mirrors for soft X-ray projection lithography by temperature optimization and ion bombardment[J]. Microelectronic Engineering, 23, 215-218(1994).
[94] Louis E, van Hattum E D, van der Westen S A et al. High reflectance multilayers for EUVL HVM-projection optics[J]. Proceedings of SPIE, 7636, 76362T(2010).
[95] Yakshin A E, van de Kruijs R W E, Nedelcu I et al. Enhanced reflectance of interface engineered Mo/Si multilayers produced by thermal particle deposition[J]. Proceedings of SPIE, 6517, 158-166(2007).
[96] Qiu Q Q, Li Q F, Su J J et al. Influence of operating parameters on target erosion of rectangular planar DC magnetron[J]. IEEE Transactions on Plasma Science, 36, 1899-1906(2008).
[97] Yu B, Jin C S, Yao S et al. Control of lateral thickness gradients of Mo–Si multilayer on curved substrates using genetic algorithm[J]. Optics Letters, 40, 3958-3961(2015).
[98] Yu B. Study on the thickness gradient control and anti-thermal damage for EUV multilayers[D]. Changchun: Changchun Institute of Optics, Fine Mechanics and Physics(2016).
[99] Wang H J. Research on laser-produced plasma source with output wavelength shorter than 15 nm[D](2020).
[100] Sizyuk T, Hassanein A. Optimization of extreme ultraviolet photons emission and collection in mass-limited laser produced plasmas for lithography application[J]. Journal of Applied Physics, 112, 033102(2012).
[101] Lan H. Research on the characteristics of laser produced Sn and SnO2 plasma[D](2016).
[102] Sizyuk T. Consequences of high-frequency operation on EUV source efficiency[J]. Physics of Plasmas, 24, 083105(2017).
[103] Fomenkov I, Brandt D, Ershov A et al. Light sources for high-volume manufacturing EUV lithography: technology, performance, and power scaling[J]. Advanced Optical Technologies, 6, 173-186(2017).
[104] Mizoguchi H, Nakarai H, Abe T et al. Challenge of high power LPP-EUV source with long collector mirror lifetime for semiconductor HVM[J]. Proceedings of SPIE, 11147, 1114705(2019).
[105] Rimbert N, Escobar S C, Meignen R et al. Spheroidal droplet deformation, oscillation and breakup in uniform outer flow[J]. Journal of Fluid Mechanics, 904, A15(2020).
[106] Tomie T. Tin laser-produced plasma as the light source for extreme ultraviolet lithography high-volume manufacturing: history, ideal plasma, present status, and prospects[J]. Nanolithography, MEMS, and MOEMS, 11, 021109(2012).
[107] Hassanein A, Sizyuk T. Laser produced plasma sources for nanolithography: recent integrated simulation and benchmarking[J]. Physics of Plasmas, 20, 053105(2013).
[108] Benoit N, Yulin S, Feigl T et al. Radiation stability of EUV Mo/Si multilayer mirrors[J]. Physica B: Condensed Matter, 357, 222-226(2005).
[109] Xu X D, Zhou H J, Hong Y L et al. Cleaning of contaminated optics devices by synchrotron radiation[J]. Vacuum science and technology, 20, 114-119(2000).
[110] Song Y. Research on atomic hydrogen cleaning carbon contaminations on EUV multilayer[D]. Changchun: Changchun Institute of Optics, Fine Mechanics and Physics(2017).
[111] Harilal S S, O’Shay B, Tao Y et al. Ion debris mitigation from tin plasma using ambient gas, magnetic field and combined effects[J]. Applied Physics B, 86, 547-553(2007).
[112] Graham S, Steinhaus C A, Clift W M et al. Atomic hydrogen cleaning of EUV multilayer optics[J]. Proceedings of SPIE, 5037, 460-469(2003).
[113] Bajt S, Chapman H N, Nguyen N et al. Design and performance of capping layers for EUV multilayer mirrors[J]. Proceedings of SPIE, 5037, 236-248(2003).
[114] Yulin S, Benoit N, Feigl T et al. Mo/Si multilayers with enhanced TiO2- and RuO2-capping layers[J]. Proceedings of SPIE, 6921, 692118(2008).
[115] Dou Y P, Sun C K, Lin J Q. Laser-produced plasma light source for extreme ultraviolet lithography[J]. Chinese Optics, 6, 20-33(2013).
[116] Leng Y X, Wang S, Zhao Q Z et al. Droplet target control system guided by laser beam[P].
[117] Brandstätter M. Debris emission and mitigation of droplet-based laser-produced plasma sources[D](2020).
[119] Niu J. Precise adjustment and control of the resonator for high power transverse flow CO2 laser[D](2013).
[120] Pan Q K, Guo J, Chen F et al. Laser power stabilizing method and laser power amplifying system[P].
[121] Pan Q K, Guo J, Chen F et al. Dual-wavelength laser coaxial output system and method[P].
[122] Li X P, Yu D Y, Guo J et al. Study on beam pointing stability of extreme ultraviolet lithography light source system[J]. Laser & Optoelectronics Progress, 58, 1714004(201).
[123] Sun H Y, Wang C, Wang G D et al. A Melting droplet generating device for EUV light source[P].
[124] Sun H Y, Wang C, Leng Y X et al. An integrated tin filling system for Droplet target in EUV light source[P].
[125] Yin P Q, Wang X B, Wu Y X et al. Experimental study on water droplet plasma induced by pulse Nd∶YAG laser[J]. Laser Technology, 44, 726-731(2020).
[126] Sun Q, Tian L C, Wu Y X et al. Research on the characteristics of laser produced tin plasma by using Langmuir probe[J]. Laser Technology, 45, 109-114(2021).
[127] Qi L H, Luo J, Li L et al. Simulation and experiment research of the uniform droplet spray process[J]. Chinese Journal of Mechanical Engineering, 44, 86-92(2008).
[128] Xiao Y, Qi L H, Zeng X H et al. Uniform metal droplet produced by pneumatic generator with controlled spray process and analysis of the droplet deposition accuracy[J]. Journal of Mechanical Engineering, 47, 156-160(2011).
[129] Wang Z S, Huang Q S, Zhang Z et al. Extreme ultraviolet, X-ray and neutron thin film optical components and systems[J]. Acta Optica Sinica, 41, 0131001(2021).
[131] Wang X, Jin C S, Li C et al. Preparation and characteristic of oxide capping-layer on extreme ultraviolet reflective mirrors[J]. Acta Optica Sinica, 35, 0331001(2015).
[132] Sun S Z, Jin C S, Yu B et al. Reflection and resputtering of Mo/Si atoms during high-energy deposition[J]. Acta Optica Sinica, 40, 1102001(2020).
[133] Sun S Z, Jin C S, Yu B et al. Research on surface roughness related coating processes of Mo/Si multilayers[J]. Acta Optica Sinica, 40, 1031002(2020).