Research Progress and Development Trend of Extreme Ultraviolet Lithography Source

Nan Lin; Wenhe Yang; Yunyi Chen; Xin Wei; Cheng Wang; Jiaoling Zhao; Yujie Peng; Yuxin Leng

doi:10.3788/LOP202259.0922002

Journals >Laser & Optoelectronics Progress >Volume 59 >Issue 9 >Page 0922002 > Article

Laser & Optoelectronics Progress
Vol. 59, Issue 9, 0922002 (2022)

Research Progress and Development Trend of Extreme Ultraviolet Lithography Source

Nan Lin^1、2、*, Wenhe Yang^1、2, Yunyi Chen^1、2, Xin Wei^1、2, Cheng Wang², Jiaoling Zhao², Yujie Peng², and Yuxin Leng^2、**

Author Affiliations

¹School of Microelectronics, Shanghai University, Shanghai 200072, China

²Department of Precision Optics Engineering, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

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DOI: 10.3788/LOP202259.0922002 Cite this Article Set citation alerts

Nan Lin, Wenhe Yang, Yunyi Chen, Xin Wei, Cheng Wang, Jiaoling Zhao, Yujie Peng, Yuxin Leng. Research Progress and Development Trend of Extreme Ultraviolet Lithography Source[J]. Laser & Optoelectronics Progress, 2022, 59(9): 0922002 Copy Citation Text

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