• Journal of Semiconductors
  • Vol. 40, Issue 12, 122403 (2019)
Buqing Xu1、3, Qiang Wu2, Lisong Dong3, and Yayi Wei1、3
Author Affiliations
  • 1University of Chinese Academy of Sciences, Beijing 100049, China
  • 2Shanghai Integrated Circuit Research & Development Center, Shanghai 201210, China
  • 3Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China
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    DOI: 10.1088/1674-4926/40/12/122403 Cite this Article
    Buqing Xu, Qiang Wu, Lisong Dong, Yayi Wei. Selection of DBO measurement wavelength for bottom mark asymmetry based on FDTD method[J]. Journal of Semiconductors, 2019, 40(12): 122403 Copy Citation Text show less

    Abstract

    A physical model for simulating overlay metrology employing diffraction based overlay (DBO) principles is built. It can help to optimize the metrology wavelength selection in DBO. Simulation result of DBO metrology with a model based on the finite-difference time-domain (FDTD) method is presented. A common case (bottom mark asymmetry) in which error signals are always induced in DBO measurement due to the process imperfection were discussed. The overlay sensitivity of the DBO measurement across the visible illumination spectrum has been performed and compared. After adjusting the model parameters compatible with the actual measurement conditions, the metrology wavelengths which provide the accuracy and robustness of DBO measurement can be optimized.
    $ \Delta R = R(x + d,\lambda ) - R(x - d,\lambda ) \approx 2d \times \frac{{\partial R}}{{\partial x}}\left| {_{x = x_0}} \right. . $ (1)

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    $ \Delta I = k d, $ (2)

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    $ \left\{ {\begin{array}{l} {{\rm{\Delta }}{I_{ - {\rm{d}}}} = k (d - d')},\\ {\Delta {I_{ + {\rm{d}}}} = k (d + d')}, \end{array}} \right. $ (3)

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    $ \Rightarrow \left\{\begin{array}{l} k = (\Delta {I_{ + {\rm{d}}}} - \Delta {I_{ - {\rm{d}}}})/2d',\\ {d = d'(\Delta {I_{ + {\rm{d}}}} + \Delta {I_{ - {\rm{d}}}})/(\Delta {I_{ + {\rm{d}}}} - \Delta {I_{ - {\rm{d}}}})}. \end{array}\right. $ (4)

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    $ \left\{\begin{array}{l} \Delta {I_{ - {\rm{d}}}} = k (d - d') + \Delta {I_{\rm{BMA}}},\\ \Delta {I_{ + {\rm{d}}}} = k (d + d') + \Delta {I_{\rm{BMA}}},\\ \Delta {\rm{overlay}} = \dfrac{{\Delta {I_{\rm{BMA}}}}}{k}. \end{array} \right. $ (5)

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    Buqing Xu, Qiang Wu, Lisong Dong, Yayi Wei. Selection of DBO measurement wavelength for bottom mark asymmetry based on FDTD method[J]. Journal of Semiconductors, 2019, 40(12): 122403
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