Yiming Li, Lin Yang, Xiaohao Wang, Shuonan Shan, Fuyuan Deng, Zhixue He, Zhengtong Liu, Xinghui Li. Overlay Metrology for Lithography Machine[J]. Laser & Optoelectronics Progress, 2022, 59(9): 0922023
- Laser & Optoelectronics Progress
- Vol. 59, Issue 9, 0922023 (2022)
Fig. 1. Status of IC testing equipment industry
Fig. 2. IC front end lithography machine. (a) ASML TWINSCAN NXE3600D lithography machine［3］; (b) domestic front end SSA600/20 lithography machine［4］
![Schema of precision and accuracy[11]](/Images/icon/loading.gif){kind=icon}
Fig. 3. Schema of precision and accuracy[11]
Fig. 4. Process flow link of overlay measurement in lithography process
Fig. 5. Market share of various inspection equipments in lithography process［17］
Fig. 6. Typical DBO overlay alignment measurement equipment Archer 300 LCM from KLA［18］
Fig. 7. Measurement principle from asymmetry to overlay［26］
Fig. 8. Classic overlay mark and schematic diagram［31］. (a) Schematic of a typical SCOL overlay mark; (b) cross-sectional view containing the superimposed grating structure
Fig. 9. Hardware structure of a typical normal incidence scatterometry[35]
Fig. 10. Diffraction results of thin and thick overlay layers[38]. (a) Captured images of the 0 and ±1 diffraction orders in thin overlay layers; (b) captured images of the 0 and ±1 diffraction orders in the thicker overlay layers
Fig. 11. Structure of angle-resolved spectroscopic lithography device[44]
Fig. 12. Schematic of the experimental setup[45]. (a) Optical system; (b) continuous wavelength diffraction and collection; (c) pupil plane map
Fig. 13. Three classical overlay marks in IBO techniques［49-50］. (a) Box-in-Box mark；(b) Bar-in-Bar mark；(c) Advanced-Image-Metrology（AIM）mark
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Table 1. Distribution of lithography process inspection equipment suppliers［17］
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