Overlay Metrology for Lithography Machine

Yiming Li; Lin Yang; Xiaohao Wang; Shuonan Shan; Fuyuan Deng; Zhixue He; Zhengtong Liu; Xinghui Li

doi:10.3788/LOP202259.0922023

Journals >Laser & Optoelectronics Progress >Volume 59 >Issue 9 >Page 0922023 > Article

Laser & Optoelectronics Progress
Vol. 59, Issue 9, 0922023 (2022)

Overlay Metrology for Lithography Machine

Yiming Li^1、2, Lin Yang³, Xiaohao Wang¹, Shuonan Shan¹, Fuyuan Deng¹, Zhixue He², Zhengtong Liu², and Xinghui Li^{1、2、4、*}

Author Affiliations

¹Shenzhen International Graduate School, Tsinghua University, Shenzhen 518055, Guangdong , China

²Peng Cheng Laboratory, Shenzhen 518055, Guangdong , China

³The Fifth Electronic Research Institute of MIIT, Guangzhou 511370, Guangdong , China

⁴Tsinghua-Berkeley Shenzhen Institute, Tsinghua University, Shenzhen 518055, Guangdong , China

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DOI: 10.3788/LOP202259.0922023 Cite this Article Set citation alerts

Yiming Li, Lin Yang, Xiaohao Wang, Shuonan Shan, Fuyuan Deng, Zhixue He, Zhengtong Liu, Xinghui Li. Overlay Metrology for Lithography Machine[J]. Laser & Optoelectronics Progress, 2022, 59(9): 0922023 Copy Citation Text

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