The technology and instrument of current photolithography applied in semiconductor industry have been very complex and expensive due to the diffraction limit barrier of linear optics. For achieving nanoscale lithography with visible and near-infrared light, the lithography method is necessary to breaking the diffraction limit. In this article, we introduce the principles and methods of super-diffraction lithography technology, review the progress and current status of laser super-diffraction lithography with problem discussion and prospect of development.