Research and Progress of Computational Lithography

Xu Ma; Sheng’en Zhang; Yihua Pan; Junbi Zhang; Chengzhen Yu; Lisong Dong; Yayi Wei

doi:10.3788/LOP202259.0922008

Journals >Laser & Optoelectronics Progress >Volume 59 >Issue 9 >Page 0922008 > Article

Laser & Optoelectronics Progress
Vol. 59, Issue 9, 0922008 (2022)

Research and Progress of Computational Lithography

Xu Ma^1、*, Sheng’en Zhang¹, Yihua Pan¹, Junbi Zhang¹, Chengzhen Yu¹, Lisong Dong^2、3, and Yayi Wei^2、3、**

Author Affiliations

¹Key Laboratory of Photoelectronic Imaging Technology and System of Ministry of Education of China, School of Optics and Photonics, Beijing Institute of Technology, Beijing 100081, China

²Integrated Circuit Advanced Process R&D Center, Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029, China

³School of Microelectronics, University of Chinese Academy of Sciences, Beijing 100049, China

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DOI: 10.3788/LOP202259.0922008 Cite this Article Set citation alerts

Xu Ma, Sheng’en Zhang, Yihua Pan, Junbi Zhang, Chengzhen Yu, Lisong Dong, Yayi Wei. Research and Progress of Computational Lithography[J]. Laser & Optoelectronics Progress, 2022, 59(9): 0922008 Copy Citation Text

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Xu Ma, Sheng’en Zhang, Yihua Pan, Junbi Zhang, Chengzhen Yu, Lisong Dong, Yayi Wei. Research and Progress of Computational Lithography[J]. Laser & Optoelectronics Progress, 2022, 59(9): 0922008

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