• Laser & Optoelectronics Progress
  • Vol. 58, Issue 15, 1516025 (2021)
Dan Wang1, Xiaodan Wang1、*, Hai Ma1, Huajun Chen1, Hongmin Mao1, and Xionghui Zeng2
Author Affiliations
  • 1Jiangsu Key Laboratory of Micro and Nano Heat Fluid Flow Technology and Energy Application, School of Physical Science and Technology, Suzhou University of Science and Technology, Suzhou, Jiangsu 215009, China
  • 2Suzhou Institute of Nanotechnology and Nano-Bionics, Chinese Academy of Sciences, Suzhou, Jiangsu 215123, China
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    DOI: 10.3788/LOP202158.1516025 Cite this Article Set citation alerts
    Dan Wang, Xiaodan Wang, Hai Ma, Huajun Chen, Hongmin Mao, Xionghui Zeng. Progress of Doping in Ga2O3 Materials[J]. Laser & Optoelectronics Progress, 2021, 58(15): 1516025 Copy Citation Text show less

    Abstract

    Compared with silicon carbide (SiC) and gallium nitride (GaN), gallium oxide (Ga2O3) has the advantages of larger band gap width, stronger breakdown field strength, larger absorption cutoff edge, and lower growth cost. Doping technique is an effective method of optimizating physical properties of materials, which can broaden the application of Ga2O3 in different fields. In this paper, the progress of rare earth and other elements doped Ga2O3 in recent years are reviewed and the luminescence characteristics of rare earth doped Ga2O3 are analyzed. Finally, the research direction of rare earth doped Ga2O3 and p-type Ga2O3 are prospected.
    Dan Wang, Xiaodan Wang, Hai Ma, Huajun Chen, Hongmin Mao, Xionghui Zeng. Progress of Doping in Ga2O3 Materials[J]. Laser & Optoelectronics Progress, 2021, 58(15): 1516025
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