• Laser & Optoelectronics Progress
  • Vol. 57, Issue 20, 200001 (2020)
Kai Wen1, Ying Ma1, Meiling Zhang1, Yu Wang1, Chi Fu1, Juanjuan Zheng1, Lixin Liu1, Peng Gao1、*, and Baoli Yao2
Author Affiliations
  • 1School of Physics and Optoelectronic Engineering, Xidian University, Xi'an, Shaanxi 710071, China
  • 2State Key Laboratory of Transient Optics and Photonics, Xi'an Institute of Optics and Precision Mechanics, Chinese Academy of Sciences, Xi'an, Shaanxi 710119, China
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    DOI: 10.3788/LOP57.200001 Cite this Article Set citation alerts
    Kai Wen, Ying Ma, Meiling Zhang, Yu Wang, Chi Fu, Juanjuan Zheng, Lixin Liu, Peng Gao, Baoli Yao. Quantitative Phase Microscopy with High Stability[J]. Laser & Optoelectronics Progress, 2020, 57(20): 200001 Copy Citation Text show less

    Abstract

    The quantitative phase microscopy is sensitive to environmental disturbance. It has been a hot topic that how to get rid of the influence of environmental disturbance on quantitative phase imaging. This review focuses on the common-path digital holography microscopy (DHM) and single beam quantitative phase microscopy. The former mainly includes Fizeau interference microscopy, Mirau interference microscopy, off-axis and coaxial point diffraction interference microscopy, DHM of double spherical illumination, and spatially-multiplexed DHM. The latter mainly includes coaxial digital holography, and quantitative phase-contrast microscopy based on parallel light illumination, ultra-oblique illumination, and multi-point off-axis illumination. We hope that this review will provide useful reference for the construction of high stability and practical quantitative phase microscopic devices.
    Kai Wen, Ying Ma, Meiling Zhang, Yu Wang, Chi Fu, Juanjuan Zheng, Lixin Liu, Peng Gao, Baoli Yao. Quantitative Phase Microscopy with High Stability[J]. Laser & Optoelectronics Progress, 2020, 57(20): 200001
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