Computational lithography is a core technology in manufacturing very large-scale integrated circuits (IC). The requirements for the lithography process are increasing rapidly with a decrease in the IC technology node. Computational lithography technology contributes considerably toward several advancements of the lithography process under the limitation of the hardware technology in lithography tools. The development of computer science provides strong support for computational lithography. However, the balance between speed and accuracy of computational lithography and computational lithography research considering lithography systems, masks, and process errors still require the collaboration of academic and industrial research and development teams. Based on a brief review of important milestones in computational lithography, we focused on an overview of the author team’s research progress in “advanced computational lithography: fast, robustness computational lithography”, including vectorial computational lithography, fast computational lithography, and multiobjective-robustness computational lithography. Finally, we present the future development of computational lithography technology, and hope that this review will help the researchers and engineers in the IC field.