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    Journals >Laser & Optoelectronics Progress >Volume 59 >Issue 9 >Page 0922027 > Article
    • Laser & Optoelectronics Progress
    • Vol. 59, Issue 9, 0922027 (2022)
    DSA in Combination with DUV Lithography for Sub-10 nm Manufacturing
    Zili Li, Xiaohua Hu, and Shisheng Xiong*
    Author Affiliations
  • School of Information Science and Technology, Fudan University, Shanghai 200438, China
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    DOI: 10.3788/LOP202259.0922027 Cite this Article Set citation alerts
    Zili Li, Xiaohua Hu, Shisheng Xiong. DSA in Combination with DUV Lithography for Sub-10 nm Manufacturing[J]. Laser & Optoelectronics Progress, 2022, 59(9): 0922027 Copy Citation Text show less
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    Article index updated: May. 20, 2024
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    Zili Li, Xiaohua Hu, Shisheng Xiong. DSA in Combination with DUV Lithography for Sub-10 nm Manufacturing[J]. Laser & Optoelectronics Progress, 2022, 59(9): 0922027
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    Paper Information
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