• Journal of Semiconductors
  • Vol. 41, Issue 12, 122102 (2020)
Baoshun Wang1、2, Jiangwei Cui1、2, Qi Guo1、2, Qiwen Zheng1、2, Ying Wei1、2, and Shanxue Xi1、2
Author Affiliations
  • 1Key Laboratory of Functional Materials and Devices under Special Environment, Chinese Academy of Sciences, Xinjiang Key Laboratory of Electric Information Materials and Devices, Xinjiang Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Urumqi 830011, China
  • 2University of Chinese Academy of Sciences, Beijing 100049, China
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    DOI: 10.1088/1674-4926/41/12/122102 Cite this Article
    Baoshun Wang, Jiangwei Cui, Qi Guo, Qiwen Zheng, Ying Wei, Shanxue Xi. The influence of total ionizing dose on the hot carrier injection of 22 nm bulk nFinFET[J]. Journal of Semiconductors, 2020, 41(12): 122102 Copy Citation Text show less
    (Color online) The structure diagram of nFinFET. (a) A 3D model of bulk FinFET. (b) A cross-section view along A–A’ direction[13].
    Fig. 1. (Color online) The structure diagram of nFinFET. (a) A 3D model of bulk FinFET. (b) A cross-section view along A–A’ direction[13].
    (Color online) Degradation of VT for nFinFETs with different numbers of fins under HCI stress for samples with a 60 nm gate length.
    Fig. 2. (Color online) Degradation of VT for nFinFETs with different numbers of fins under HCI stress for samples with a 60 nm gate length.
    (Color online) Degradation of saturation current (IDSAT) for nFinFETs with different numbers of fins under HCI stress for samples with a 60 nm gate length.
    Fig. 3. (Color online) Degradation of saturation current (IDSAT) for nFinFETs with different numbers of fins under HCI stress for samples with a 60 nm gate length.
    (Color online) IDS–VGS curves as a function of the irradiation dose for nFinFET with 8 fins and a 60 nm gate length biased at the ON state.
    Fig. 4. (Color online) IDSVGS curves as a function of the irradiation dose for nFinFET with 8 fins and a 60 nm gate length biased at the ON state.
    (Color online) Degradation of VT as a function of stress time for un-irradiated nFinFETs and for irradiated nFinFETs in different bias conditions during irradiation. (a) For 4 fin samples with a 60 nm gate length. (b) For 8 fin samples with a 60 nm gate length.
    Fig. 5. (Color online) Degradation of VT as a function of stress time for un-irradiated nFinFETs and for irradiated nFinFETs in different bias conditions during irradiation. (a) For 4 fin samples with a 60 nm gate length. (b) For 8 fin samples with a 60 nm gate length.
    (Color online) Degradation of IDSAT as a function of stress time for un-irradiated nFinFETs and for irradiated nFinFETs in different bias condition during irradiation. (a) For 4 fin samples with a 60 nm gate length. (b) For 8 fin samples with a 60 nm gate length.
    Fig. 6. (Color online) Degradation of IDSAT as a function of stress time for un-irradiated nFinFETs and for irradiated nFinFETs in different bias condition during irradiation. (a) For 4 fin samples with a 60 nm gate length. (b) For 8 fin samples with a 60 nm gate length.
    (Color online) A schematic diagram showing that total dose irradiation causes trap holes in STI[15].
    Fig. 7. (Color online) A schematic diagram showing that total dose irradiation causes trap holes in STI[15].
    DeviceUn-irradiatedOFF irradiatedTG irradiatedON irradiated
    Lgate = 60 nm, 4 fin 30.15%27.31%25.63%4.00%
    Lgate = 60 nm, 8 fin 17.32%14.46%11.29%7.69%
    Table 1. VT degradation percentage of un-irradiated devices, OFF-bias irradiated devices, TG-bias irradiated devices, and ON-bias irradiated devices in different groups after 6000 s hot carrier stress.
    DeviceUn-irradiatedOFF irradiatedTG irradiatedON irradiated
    Lgate = 60 nm, 4 fin 9.56%7.39%3.88%1.24%
    Lgate = 60 nm, 8 fin 4.5%3.68%3%1.67%
    Table 2. IDSAT degradation percentage of un-irradiated devices, OFF-bias irradiated devices, TG-bias irradiated devices, and ON-bias irradiated devices in different groups after 6000 s hot carrier stress.
    Baoshun Wang, Jiangwei Cui, Qi Guo, Qiwen Zheng, Ying Wei, Shanxue Xi. The influence of total ionizing dose on the hot carrier injection of 22 nm bulk nFinFET[J]. Journal of Semiconductors, 2020, 41(12): 122102
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