• Chinese Optics Letters
  • Vol. 16, Issue 3, 030801 (2018)
Shanshan Mao, Yanqiu Li*, Jiahua Jiang, Shihuan Shen, Ke Liu, and Meng Zheng
Author Affiliations
  • Key Laboratory of Photoelectron Imaging Technology and System of the Ministry of Education, School of Optics and Photonics, Beijing Institute of Technology, Beijing 100081, China
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    DOI: 10.3788/COL201816.030801 Cite this Article Set citation alerts
    Shanshan Mao, Yanqiu Li, Jiahua Jiang, Shihuan Shen, Ke Liu, Meng Zheng. Design of a hyper-numerical-aperture deep ultraviolet lithography objective with freeform surfaces[J]. Chinese Optics Letters, 2018, 16(3): 030801 Copy Citation Text show less
    Layout of the initial aspheric PO. The red dots represent aspheric surfaces.
    Fig. 1. Layout of the initial aspheric PO. The red dots represent aspheric surfaces.
    Lens-form parameters of a single element in aspheric PO: (a) |Δwj| value of a single element and (b) |Δsj| value of a single element.
    Fig. 2. Lens-form parameters of a single element in aspheric PO: (a) |Δwj| value of a single element and (b) |Δsj| value of a single element.
    Aspheric PO structure after removing one element.
    Fig. 3. Aspheric PO structure after removing one element.
    Aspheric PO structure after removing two elements.
    Fig. 4. Aspheric PO structure after removing two elements.
    (a) Aspheric PO sampled fields and (b) footprint map.
    Fig. 5. (a) Aspheric PO sampled fields and (b) footprint map.
    FFSs PO sampled fields.
    Fig. 6. FFSs PO sampled fields.
    PO structure with four FFSs.
    Fig. 7. PO structure with four FFSs.
    Modulation transfer function plot.
    Fig. 8. Modulation transfer function plot.
    FFSs PO footprint map.
    Fig. 9. FFSs PO footprint map.
    (a) Wavefront RMS error and (b) distortion in the full image field.
    Fig. 10. (a) Wavefront RMS error and (b) distortion in the full image field.
    Local curvature of FFSs in the X and Y directions. Only the used area of each surface is shown. (a) S16; (b) S21; (c) S22; (d) S33.
    Fig. 11. Local curvature of FFSs in the X and Y directions. Only the used area of each surface is shown. (a) S16; (b) S21; (c) S22; (d) S33.
    Surface No.wjSurface No.sj
    S300.3071S300.9891
    S200.2472S200.9363
    S190.1918S10.5773
    S150.1334S150.4754
    S230.1301S170.3222
    S380.0519S410.3073
    S170.0485S190.2142
    S10.0372S40.2090
    S60.0312S230.1843
    S40.0162S60.1601
    S410.0161S310.1447
    S330.0149S380.1168
    S310.0050S330.0618
    Table 1. Lens-form Parameter Values of Aspheric Surfaces
    ItemASPSs POFFSs PO
    Numerical aperture1.21.2
    Wavelength193 nm193 nm
    Image-side field of view26mm×5.5mm26mm×5.5mm
    Magnification0.250.25
    Front working distance33 mm33 mm
    Total track length1253 mm1232 mm
    Number of aspheric surfaces139
    Number of freeform surfaces4
    Number of lenses2523
    Thickness of all lenses659 mm631 mm
    Telecentricity<6mrad<6mrad
    Max. aspheric departure<1.7mm<1.35mm
    Wavefront RMS error<0.006λ<0.005λ
    Distortion<1nm<0.5nm
    Table 2. Optical Characteristics of ASPSs and FFSs POs
    Shanshan Mao, Yanqiu Li, Jiahua Jiang, Shihuan Shen, Ke Liu, Meng Zheng. Design of a hyper-numerical-aperture deep ultraviolet lithography objective with freeform surfaces[J]. Chinese Optics Letters, 2018, 16(3): 030801
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