Design of a hyper-numerical-aperture deep ultraviolet lithography objective with freeform surfaces

Shanshan Mao; Yanqiu Li; Jiahua Jiang; Shihuan Shen; Ke Liu; Meng Zheng

doi:10.3788/COL201816.030801

Journals >Chinese Optics Letters >Volume 16 >Issue 3 >Page 030801 > Article

Chinese Optics Letters
Vol. 16, Issue 3, 030801 (2018)

Design of a hyper-numerical-aperture deep ultraviolet lithography objective with freeform surfaces

Shanshan Mao, Yanqiu Li^*, Jiahua Jiang, Shihuan Shen, Ke Liu, and Meng Zheng

Author Affiliations

Key Laboratory of Photoelectron Imaging Technology and System of the Ministry of Education, School of Optics and Photonics, Beijing Institute of Technology, Beijing 100081, China

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DOI: 10.3788/COL201816.030801 Cite this Article Set citation alerts

Shanshan Mao, Yanqiu Li, Jiahua Jiang, Shihuan Shen, Ke Liu, Meng Zheng. Design of a hyper-numerical-aperture deep ultraviolet lithography objective with freeform surfaces[J]. Chinese Optics Letters, 2018, 16(3): 030801 Copy Citation Text

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