Research Progress on Stage Control Methods for a Lithography Machine

Longbin Jiang; Runze Ding; Chenyang Ding; Xiaofeng Yang; Yunlang Xu

doi:10.3788/LOP202259.0922003

Journals >Laser & Optoelectronics Progress >Volume 59 >Issue 9 >Page 0922003 > Article

Laser & Optoelectronics Progress
Vol. 59, Issue 9, 0922003 (2022)

Research Progress on Stage Control Methods for a Lithography Machine

Longbin Jiang¹, Runze Ding¹, Chenyang Ding^1、*, Xiaofeng Yang^2、**, and Yunlang Xu²

Author Affiliations

¹Shanghai Engineering Research Center of Ultra-Precision Motion Control and Measurement, Academy for Engineering and Technology, Fudan University, Shanghai 200433, China

²State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai 200433, China

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DOI: 10.3788/LOP202259.0922003 Cite this Article Set citation alerts

Longbin Jiang, Runze Ding, Chenyang Ding, Xiaofeng Yang, Yunlang Xu. Research Progress on Stage Control Methods for a Lithography Machine[J]. Laser & Optoelectronics Progress, 2022, 59(9): 0922003 Copy Citation Text

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Longbin Jiang, Runze Ding, Chenyang Ding, Xiaofeng Yang, Yunlang Xu. Research Progress on Stage Control Methods for a Lithography Machine[J]. Laser & Optoelectronics Progress, 2022, 59(9): 0922003

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