Research on Mask Defect Inspection and Compensation Techniques in Extreme Ultraviolet Lithography

Wei Cheng; Sikun Li; Zinan Zhang; Xiangzhao Wang

doi:10.3788/LOP202259.0922022

Journals >Laser & Optoelectronics Progress >Volume 59 >Issue 9 >Page 0922022 > Article

Laser & Optoelectronics Progress
Vol. 59, Issue 9, 0922022 (2022)

Research on Mask Defect Inspection and Compensation Techniques in Extreme Ultraviolet Lithography

Wei Cheng^1、2, Sikun Li^1、2, Zinan Zhang^1、2, and Xiangzhao Wang^1、2、*

Author Affiliations

¹Laboratory of Information Optics and Opt-Electronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

²Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

show less

DOI: 10.3788/LOP202259.0922022 Cite this Article Set citation alerts

Wei Cheng, Sikun Li, Zinan Zhang, Xiangzhao Wang. Research on Mask Defect Inspection and Compensation Techniques in Extreme Ultraviolet Lithography[J]. Laser & Optoelectronics Progress, 2022, 59(9): 0922022 Copy Citation Text

show less

Cited By

Article index updated: May. 30, 2024

Citation counts are provided from Researching.

The article is cited by 1 article(s) from Researching.