• Laser & Optoelectronics Progress
  • Vol. 57, Issue 9, 090001 (2020)
Jun Kang1、*, Ziruo Cui1、2、**, Ping Zhu1, qi Gao1, Ailin Guo1, Haidong Zhu1, Qingwei Yang1, Meizhi Sun1, Xinglong Xie1, and Jianqiang Zhu1
Author Affiliations
  • 1National Laboratory on High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 2Center of Materials Science and Optoeletronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
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    DOI: 10.3788/LOP57.090001 Cite this Article Set citation alerts
    Jun Kang, Ziruo Cui, Ping Zhu, qi Gao, Ailin Guo, Haidong Zhu, Qingwei Yang, Meizhi Sun, Xinglong Xie, Jianqiang Zhu. Research Progress of Achromatic Technology in Ultra-Short and Ultra-Intense Laser Facility[J]. Laser & Optoelectronics Progress, 2020, 57(9): 090001 Copy Citation Text show less
    Chromatic aberration of SGII 5 PW device. (a)PTD caused by accumulated chromatic aberration the spatial filter; (b) terminal focal spot dispersion caused by chromatic aberration
    Fig. 1. Chromatic aberration of SGII 5 PW device. (a)PTD caused by accumulated chromatic aberration the spatial filter; (b) terminal focal spot dispersion caused by chromatic aberration
    Wave front deviation caused by chromatic aberration at the end of the SGII 5 PW device. (a) 858 nm wave front; (b) 758 nm wave front; (c) change in wave front deviation with lens radius
    Fig. 2. Wave front deviation caused by chromatic aberration at the end of the SGII 5 PW device. (a) 858 nm wave front; (b) 758 nm wave front; (c) change in wave front deviation with lens radius
    Design drawing of Texas PW device [35]
    Fig. 3. Design drawing of Texas PW device [35]
    Mirror-based expander system. (a) Schematic diagram[39]; (b) device diagram of Japan J-KAREN-P facility[37]
    Fig. 4. Mirror-based expander system. (a) Schematic diagram[39]; (b) device diagram of Japan J-KAREN-P facility[37]
    Amplification link of Texas PW laser facility [40]
    Fig. 5. Amplification link of Texas PW laser facility [40]
    Chromatic aberration compensation unit of Offner structure. (a) Schematic diagram; (b) Sketch of MTW-OPAL facility [20]
    Fig. 6. Chromatic aberration compensation unit of Offner structure. (a) Schematic diagram; (b) Sketch of MTW-OPAL facility [20]
    Schematic of the PTD compensator of QG-200TW facility[42]
    Fig. 7. Schematic of the PTD compensator of QG-200TW facility[42]
    Schematic of CAEP 5 PW facility[44]
    Fig. 8. Schematic of CAEP 5 PW facility[44]
    Schematic of SULF 10 PW facility[45]
    Fig. 9. Schematic of SULF 10 PW facility[45]
    Schematic of the PETEL facility[48]
    Fig. 10. Schematic of the PETEL facility[48]
    Unit of the PTD compensator OMEGA EP[49]
    Fig. 11. Unit of the PTD compensator OMEGA EP[49]
    Optical schematic of amplification stage and PTD compensator of XG-PW[50]
    Fig. 12. Optical schematic of amplification stage and PTD compensator of XG-PW[50]
    Unit of the PTD compensator of SGII 5 PW[14,25]. (a) Optical layout; (b) schematic diagram
    Fig. 13. Unit of the PTD compensator of SGII 5 PW[14,25]. (a) Optical layout; (b) schematic diagram
    Changes in the focal of the terminal before and after chromatic aberration compensation[14]. (a) Focal spot before compensation; (b) focal spot after compensation; (c) horizontal and longitudinal spatial distribution before compensation; (d) horizontal and longitudinal spatial distribution of focal spot after compensation
    Fig. 14. Changes in the focal of the terminal before and after chromatic aberration compensation[14]. (a) Focal spot before compensation; (b) focal spot after compensation; (c) horizontal and longitudinal spatial distribution before compensation; (d) horizontal and longitudinal spatial distribution of focal spot after compensation
    Jun Kang, Ziruo Cui, Ping Zhu, qi Gao, Ailin Guo, Haidong Zhu, Qingwei Yang, Meizhi Sun, Xinglong Xie, Jianqiang Zhu. Research Progress of Achromatic Technology in Ultra-Short and Ultra-Intense Laser Facility[J]. Laser & Optoelectronics Progress, 2020, 57(9): 090001
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