Research Progress of Achromatic Technology in Ultra-Short and Ultra-Intense Laser Facility

Jun Kang; Ziruo Cui; Ping Zhu; qi Gao; Ailin Guo; Haidong Zhu; Qingwei Yang; Meizhi Sun; Xinglong Xie; Jianqiang Zhu

doi:10.3788/LOP57.090001

Journals >Laser & Optoelectronics Progress >Volume 57 >Issue 9 >Page 090001 > Article

Laser & Optoelectronics Progress
Vol. 57, Issue 9, 090001 (2020)

Research Progress of Achromatic Technology in Ultra-Short and Ultra-Intense Laser Facility

Jun Kang^1、*, Ziruo Cui^1、2、**, Ping Zhu¹, qi Gao¹, Ailin Guo¹, Haidong Zhu¹, Qingwei Yang¹, Meizhi Sun¹, Xinglong Xie¹, and Jianqiang Zhu¹

Author Affiliations

¹National Laboratory on High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

²Center of Materials Science and Optoeletronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

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DOI: 10.3788/LOP57.090001 Cite this Article Set citation alerts

Jun Kang, Ziruo Cui, Ping Zhu, qi Gao, Ailin Guo, Haidong Zhu, Qingwei Yang, Meizhi Sun, Xinglong Xie, Jianqiang Zhu. Research Progress of Achromatic Technology in Ultra-Short and Ultra-Intense Laser Facility[J]. Laser & Optoelectronics Progress, 2020, 57(9): 090001 Copy Citation Text

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