• Laser & Optoelectronics Progress
  • Vol. 57, Issue 9, 090001 (2020)
Jun Kang1、*, Ziruo Cui1、2、**, Ping Zhu1, qi Gao1, Ailin Guo1, Haidong Zhu1, Qingwei Yang1, Meizhi Sun1, Xinglong Xie1, and Jianqiang Zhu1
Author Affiliations
  • 1National Laboratory on High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 2Center of Materials Science and Optoeletronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
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    DOI: 10.3788/LOP57.090001 Cite this Article Set citation alerts
    Jun Kang, Ziruo Cui, Ping Zhu, qi Gao, Ailin Guo, Haidong Zhu, Qingwei Yang, Meizhi Sun, Xinglong Xie, Jianqiang Zhu. Research Progress of Achromatic Technology in Ultra-Short and Ultra-Intense Laser Facility[J]. Laser & Optoelectronics Progress, 2020, 57(9): 090001 Copy Citation Text show less

    Abstract

    Due to the wide spectral bandwidth of ultra-short and ultra-intense laser facility, the use of traditional spatial filter lens groups to expand the beam will cause the accumulation of chromatic aberrations of the device, which will seriously affect the quality of the terminal focal spot. In this paper, the main technology and research progress of eliminating chromatic aberration in ultra-short and ultra-intense laser facilities are reviewed, and both the advantages and disadvantages of several main schemes are compared and summarized. On this basis, a scheme for dynamic and accurate compensation of the chromatic aberration of the facility is proposed, which has been verified and used in actual engineering. This paper also analyses and prospects the development direction of chromatic aberration compensation.
    Jun Kang, Ziruo Cui, Ping Zhu, qi Gao, Ailin Guo, Haidong Zhu, Qingwei Yang, Meizhi Sun, Xinglong Xie, Jianqiang Zhu. Research Progress of Achromatic Technology in Ultra-Short and Ultra-Intense Laser Facility[J]. Laser & Optoelectronics Progress, 2020, 57(9): 090001
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