Author Affiliations
1Department of Electrical Engineering, College of Engineering, Qassim University, Unaizah 56452, Saudi Arabia2Department of Electrical Engineering, Faculty of Engineering, Aswan University, Aswan 81542, Egyptshow less
Fig. 1. (Color online) (a) Top-view FESEM images, (b) AFM image of UNCD/a-C:H film surface, (c) cross-sectional FESEM image, (d) schematic representation, and (e) semi-logarithmic and linear (inset) J–V characteristics of N2-doped (UNCD/a-C:H)/p-Si heterojunctions.
Fig. 2. (Color online) C–V characteristics of (N2-doped UNCD/a-C:H)/p-type Si heterojunction, measured at different frequencies from 50 kHz to 2 MHz.
Fig. 3. (Color online) C–V characteristics of (N2-doped UNCD/a-C:H)/p-type Si heterojunction, measured at different frequencies from 50 to 100 kHz.
Fig. 4. (Color online) Zr and Zim spectra of (N2-doped UNCD/a-C:H)/p-type Si heterojunction, measured at different temperatures from 300 to 400 K.
Fig. 5. (Color online) C–f characteristics of (N2-doped UNCD/a-C:H)/p-type Si heterojunction, measured at different temperatures.
Fig. 6. Arrhenius plot of ln(fm) of (N2-doped UNCD/a-C:H)/p-type Si heterojunction.
Fig. 7. Energy-distributed trap-DOS of N2-doped UNCD/a-C:H film measured (dots) and fitted (lines) data at temperatures of (a) 300 K, (b) 325 K, (c) 350 K, (d) 375 K, and (e) 400 K.
T (K)
| NG (1016cm–3eV–1)
| Et (eV)
| σ (eV)
|
---|
300 | 2.84 | 0.120 | 0.064 | 325 | 1.56 | 0.158 | 0.058 | 350 | 4.48 | 0.159 | 0.041 | 375 | 7.12 | 0.189 | 0.050 | 400 | 27.3 | 0.233 | 0.050 |
|
Table 1. Extracted Gaussian-distributed defect parameters of N2-doped UNCD/a-C:H films characterized at different temperatures.