For the step & scan projection lithographic machines, the synchronous servo performance of the reticle and wafer stages will directly affect the technical indexes of the machine. The reticle and wafer stages are typical six degree-of-freedom ultra-precision motion stages. The core control problem is to balance high dynamic and ultra-precision motions under the conditions of coupled dynamics and complex internal and external disturbances. The research and development of ultra-precision motion stage control technology for integrated circuit lithography is of great significance to realize the domestic manufacturing of high-end lithographic machine. This paper first describes the servo performance requirements of ultra-precision motion stages for high-end lithographic machines and the technical challenges to meet these requirements. Then, this paper reviews the research results and recent progress of ultra-precision motion stage control for lithographic machines from five aspects: decoupling control, feedback control, feedforward control, trajectory generation, and cooperative control, and reviews the existing problems and development trends.