• Journal of Semiconductors
  • Vol. 40, Issue 1, 012803 (2019)
Yuanjie Lü, Xubo Song, Zezhao He, Yuangang Wang, Xin Tan, Shixiong Liang, Cui Wei, Xingye Zhou, and Zhihong Feng
Author Affiliations
  • National Key Laboratory of Application Specific Integrated Circuit (ASIC), Hebei Semiconductor Research Institute, Shijiazhuang 050051, China
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    DOI: 10.1088/1674-4926/40/1/012803 Cite this Article
    Yuanjie Lü, Xubo Song, Zezhao He, Yuangang Wang, Xin Tan, Shixiong Liang, Cui Wei, Xingye Zhou, Zhihong Feng. Source-field-plated Ga2O3 MOSFET with a breakdown voltage of 550 V[J]. Journal of Semiconductors, 2019, 40(1): 012803 Copy Citation Text show less
    (Color online) Schematic cross section of the fabricated Ga2O3 MOSFET with Lgd of 4 μm.
    Fig. 1. (Color online) Schematic cross section of the fabricated Ga2O3 MOSFET with Lgd of 4 μm.
    (Color online) (a) DC output and (b) transfer characteristics of the Ga2O3 MOSFET with Lgd of 4 μm.
    Fig. 2. (Color online) (a) DC output and (b) transfer characteristics of the Ga2O3 MOSFET with Lgd of 4 μm.
    (Color online) Three-terminal off-state breakdown characteristics for the Ga2O3 MOSFET with and without source-field plate.
    Fig. 3. (Color online) Three-terminal off-state breakdown characteristics for the Ga2O3 MOSFET with and without source-field plate.
    (Color online) Breakdown characteristics for the Ga2O3 MOSFET with Lgd of (a) 8 μm and (b) different gate-to-drain length.
    Fig. 4. (Color online) Breakdown characteristics for the Ga2O3 MOSFET with Lgd of (a) 8 μm and (b) different gate-to-drain length.
    Yuanjie Lü, Xubo Song, Zezhao He, Yuangang Wang, Xin Tan, Shixiong Liang, Cui Wei, Xingye Zhou, Zhihong Feng. Source-field-plated Ga2O3 MOSFET with a breakdown voltage of 550 V[J]. Journal of Semiconductors, 2019, 40(1): 012803
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