• Acta Optica Sinica
  • Vol. 40, Issue 10, 1023001 (2020)
Shibiao Liu, Guangxu Wang*, Xiaoming Wu, Chunlan Mo, and Jiangli Zhang
Author Affiliations
  • National Institute of LED on Silicon Substrate, Nanchang University, Nanchang, Jiangxi 330096, China
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    DOI: 10.3788/AOS202040.1023001 Cite this Article Set citation alerts
    Shibiao Liu, Guangxu Wang, Xiaoming Wu, Chunlan Mo, Jiangli Zhang. Electro-Static Failure Evolution of GaN-Based LED Thin Film Chip with Ag Mirrors[J]. Acta Optica Sinica, 2020, 40(10): 1023001 Copy Citation Text show less
    Optical micrograph of ESD black spot
    Fig. 1. Optical micrograph of ESD black spot
    Schematic of chip structure
    Fig. 2. Schematic of chip structure
    Chip morphologies after application of different ESD voltages. (a) 300 V; (b) 400 V; (c) 600 V; (d) 800 V; (e) 1000 V; (f) SEM image of ESD black spot in Fig.3(e)
    Fig. 3. Chip morphologies after application of different ESD voltages. (a) 300 V; (b) 400 V; (c) 600 V; (d) 800 V; (e) 1000 V; (f) SEM image of ESD black spot in Fig.3(e)
    I-V characteristic curves of LED chip
    Fig. 4. I-V characteristic curves of LED chip
    Photoluminescence micrographs. (a) Before black spot emerging; (b) after black spot emerging
    Fig. 5. Photoluminescence micrographs. (a) Before black spot emerging; (b) after black spot emerging
    EDS component analysis of electro-static breakdown spillage. (a) Electro-static hole measured by EDS; (b) EDS energy spectrum of electro-static breakdown spillage
    Fig. 6. EDS component analysis of electro-static breakdown spillage. (a) Electro-static hole measured by EDS; (b) EDS energy spectrum of electro-static breakdown spillage
    SEM images of GaN roughness surface under different EDS voltages. (a) 400 V; (b) 600 V; (c) 800 V; (d) 1200 V; (e) 1500 V
    Fig. 7. SEM images of GaN roughness surface under different EDS voltages. (a) 400 V; (b) 600 V; (c) 800 V; (d) 1200 V; (e) 1500 V
    SEM image of wafer C3 after FIB etching
    Fig. 8.

    SEM image of wafer C3 after FIB etching

    SampleInsideOutside
    A1104105
    A2110123
    Table 1. Number of ESD black spots inside and outside electrode line
    SampleNumber of ESD black spotsR1 /%R2 /%
    Outer ringInner ring
    A3981116.624.40
    A41001336.755.28
    Table 2. Number of ESD black spots in inner and outer rings of wafer
    Shibiao Liu, Guangxu Wang, Xiaoming Wu, Chunlan Mo, Jiangli Zhang. Electro-Static Failure Evolution of GaN-Based LED Thin Film Chip with Ag Mirrors[J]. Acta Optica Sinica, 2020, 40(10): 1023001
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