Lithography Technology During the Past Six Decades

Baoqin Chen

doi:10.3788/LOP202259.0922031

Journals >Laser & Optoelectronics Progress >Volume 59 >Issue 9 >Page 0922031 > Article

Laser & Optoelectronics Progress
Vol. 59, Issue 9, 0922031 (2022)

Lithography Technology During the Past Six Decades

Baoqin Chen^1、2、*

Author Affiliations

¹Institute of Microelectronics (IMECAS), Chinese Academy of Sciences, Beijing 100029, China

²School of Integrated Circuits, University of Chinese Academy of Sciences, Beijing 100049, China

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DOI: 10.3788/LOP202259.0922031 Cite this Article Set citation alerts

Baoqin Chen. Lithography Technology During the Past Six Decades[J]. Laser & Optoelectronics Progress, 2022, 59(9): 0922031 Copy Citation Text

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References

[1] Wei Y Y[M]. Advanced lithography theory and application of very large scale integration(2020).

[2] Chen B Q. Looking back on the hardships of the past 50 years, we can see the achievements in details: the development track of plate making lithography technology in China[J]. Electronic Component News, 4, 11-12(2000).

[3] Chen B Q. Review and current situation of development of plate making lithography and micro/nano processing technology in China[J]. Microfabrication Technology, 1-2(2006).

[4] Wang Y Y. Chapter 8: integrated circuit special equipment[M]. Integrated circuit industry(2018).

[5] He J, Xia J B. Micro lithography and micro nano processing technology[M]. Semiconductor science and technology, 306-350(2007).

[6] Chen B Q. Microlithography and micro-anometerprocess technology[J]. Nanotechnology and Precision Engineering, 1-5(2011).

[7] Luo X B. Study of electron beam lithography model[D](2008).

Baoqin Chen. Lithography Technology During the Past Six Decades[J]. Laser & Optoelectronics Progress, 2022, 59(9): 0922031

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