Nowadays, the world is inseparable from the information technology (IT), while IT is inseparable from the integrated circuit (IC) semiconductor manufacturing technology, that is, microelectronics technology. The most critical technology in IC semiconductor manufacturing is lithography. Lithography emerged in 1958 when Texas Instruments produced the world’s first planar IC. Over the past short 60 years, the lithography resolution limit has been broken again and again, creating a miracle on earth. As the basis of microelectronics technology, lithography and micro-nanofabrication technologies are the highest accuracy manufacturing techonologies so far. Lithography process sizes range from several hundredmicrons to 10 nanometers. Process methods develop from plate ruler scalpel and camera to electron beam lithography. Light source wavelengths range from optical exposure to extreme ultraviolet exposure. In the development process, integration increases by about ten billion times, while the characteristic dimension has been reduced to about one ten-thousandth of the original value. With the rapid development of IC, lithography has also moved from the era of equivalent Moore into the post-Moore era.