[1] S. Pathak, D. Van Thourhout, W. Bogaerts. Design trade-offs for silicon-on-insulator-based AWGs for (de)multiplexer applications. Opt. Lett., 38, 2961-2964(2013).
[2] A. Ribeiro, S. Dwivedi, W. Bogaerts. A thermally tunable but athermal silicon MZI filter. 18th European Conference on Integrated Optics 2016 (ECIO)(2016).
[3] S. Dwivedi, H. D’heer, W. Bogaerts. Maximizing fabrication and thermal tolerances of all-silicon FIR wavelength filters. IEEE Photon. Technol. Lett., 27, 871-874(2015).
[4] W. A. Zortman, D. C. Trotter, M. R. Watts. Silicon photonics manufacturing. Opt. Express, 18, 23598-23607(2010).
[5] Z. Lu, J. Jhoja, J. Klein, X. Wang, A. Liu, J. Flueckiger, J. Pond, L. Chrostowski. Performance prediction for silicon photonics integrated circuits with layout-dependent correlated manufacturing variability. Opt. Express, 25, 9712-9733(2017).
[6] T.-W. Weng, Z. Zhang, Z. Su, Y. Marzouk, A. Melloni, L. Daniel. Uncertainty quantification of silicon photonic devices with correlated and non-Gaussian random parameters. Opt. Express, 23, 4242-4254(2015).
[7] Y. Xing, D. Spina, A. Li, T. Dhaene, W. Bogaerts. Stochastic collocation for device-level variability analysis in integrated photonics. Photon. Res., 4, 93-100(2016).
[8] W. Bogaerts, M. Fiers, P. Dumon. Design challenges in silicon photonics. IEEE J. Sel. Top. Quantum Electron., 20, 8202008(2014).
[9] N. Ayotte, A. D. Simard, S. Larochelle. Long integrated Bragg gratings for SOI wafer metrology. IEEE Photon. Technol. Lett., 27, 755-758(2015).
[10] X. Wang, W. Shi, H. Yun, S. Grist, N. A. F. Jaeger, L. Chrostowski. Narrow-band waveguide Bragg gratings on SOI wafers with CMOS-compatible fabrication process. Opt. Express, 20, 15547-15558(2012).
[11] S. Dwivedi, A. Ruocco, M. Vanslembrouck, T. Spuesens, P. Bienstman, P. Dumon, T. Van Vaerenbergh, W. Bogaerts. Experimental extraction of effective refractive index and thermo-optic coefficients of silicon-on-insulator waveguides using interferometers. J. Lightwave Technol., 33, 4471-4477(2015).
[12] T. Horikawa, D. Shimura, H. Takahashi, J. Ushida, Y. Sobu, A. Shiina, M. Tokushima, S.-H. Jeong, K. Kinoshita, T. Mogami. Extraction of SOI thickness deviation based on resonant wavelength analysis for silicon photonics devices. IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S), 10, 1-3(2017).
[13] W. Bogaerts, L. Chrostowski. Silicon photonics circuit design: methods, tools and challenges. Laser Photon. Rev., 12, 1700237(2018).
[14] S. K. Selvaraja, W. Bogaerts, P. Dumon, D. Van Thourhout, R. Baets. Subnanometer linewidth uniformity in silicon nanophotonic waveguide devices using CMOS fabrication technology. IEEE J. Sel. Top. Quantum Electron., 16, 316-324(2010).
[15] S. K. Selvaraja, E. Rosseel, L. Fernandez, M. Tabat, W. Bogaerts, J. Hautala, P. Absil. SOI thickness uniformity improvement using corrective etching for silicon nano-photonic device. IEEE International Conference on Group IV Photonics GFP, 71-73(2011).
[16] S. K. Selvaraja. Wafer-Scale Fabrication Technology for Silicon Photonic Integrated Circuits(2011).
[17] R. G. Beausoleil, A. Faraon, D. Fattal, M. Fiorentino, Z. Peng, C. Santori. Devices and architectures for large-scale integrated silicon photonics circuits. Proc. SPIE, 7942, 794204(2011).
[18] X. Chen, M. Mohamed, Z. Li, L. Shang, A. R. Mickelson. Process variation in silicon photonic devices. Appl. Opt., 52, 7638-7647(2013).
[19] S. K. Selvaraja, G. Winroth, S. Locorotondo, G. Murdoch, A. Milenin, C. Delvaux, P. Ong, S. Pathak, W. Xie, G. Sterckx, G. Lepage, D. Van Thourhout, W. Bogaerts, J. Van Campenhout, P. Absil. 193??nm immersion lithography for high-performance silicon photonic circuits. Proc. SPIE, 9052, 90520F(2014).
[20] M. Fiers, T. Van Vaerenbergh, J. Dambre, P. Bienstman. CAPHE: time-domain and frequency-domain modeling of nonlinear optical components. Advanced Photonics Congress, IM2B.3(2012).
[21] D.-X. Xu, J. H. Schmid, G. T. Reed, G. Z. Mashanovich, D. J. Thomson, M. Nedeljkovic, X. Chen, D. Van Thourhout, S. Keyvaninia, S. K. Selvaraja. Silicon photonic integration platform—have we found the sweet spot?. IEEE J. Sel. Top. Quantum Electron., 20, 8100217(2014).