• Photonics Research
  • Vol. 6, Issue 11, 1008 (2018)
Yufei Xing1、2、*, Jiaxing Dong1、2, Sarvagya Dwivedi3, Umar Khan1、2, and Wim Bogaerts1、2
Author Affiliations
  • 1Photonics Research Group, Ghent University-IMEC, Ghent, Belgium
  • 2Center of Nano and Biophotonics, Ghent, Belgium
  • 3Electrical and Computer Engineering Department, University of California Santa Barbara, Santa Barbara, California 93106-9560, USA
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    DOI: 10.1364/PRJ.6.001008 Cite this Article Set citation alerts
    Yufei Xing, Jiaxing Dong, Sarvagya Dwivedi, Umar Khan, Wim Bogaerts. Accurate extraction of fabricated geometry using optical measurement[J]. Photonics Research, 2018, 6(11): 1008 Copy Citation Text show less

    Abstract

    We experimentally demonstrate extraction of silicon waveguide geometry with subnanometer accuracy using optical measurements. Effective and group indices of silicon-on-insulator (SOI) waveguides are extracted from the optical measurements. An accurate model linking the geometry of an SOI waveguide to its effective and group indices is used to extract the linewidths and thicknesses within respective errors of 0.37 and 0.26 nm on a die fabricated by IMEC multiproject wafer services. A detailed analysis of the setting of the bounds for the effective and group indices is presented to get the right extraction with improved accuracy.
    w=p0+Σi=1npeineffi+Σj=1npgjngj+Σj=1,i=1m,npegijneffingj,(1)

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    t=q0+Σi=1nqeineffi+Σj=1nqgjngj+Σj=1,i=1m,nqegijneffingj,(2)

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    m=neff,0ΔLλres,(3)

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    FSR=λres2ngΔL,(4)

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    neff,0ΔLλ=m,(neff,0Δneff/2)ΔLλ>m0.5,(neff,0+Δneff/2)ΔLλ<m+0.5.(5)

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    m<neff,0Δneff.(5)

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    ΔL<λΔneff.(6)

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    neff=neff0+neffw(ww0)+nefft(tt0),ng=ng0+ngw(ww0)+ngt(tt0).(8)

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    neff1=neff0+neffw(w1w0)+nefft(t1t0),(7)

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    neff2=neff0+neffw(w2w0)+nefft(t2t0),(8)

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    ng1=ng0+ngw(w2w0)+ngt(t1t0),(9)

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    ng2=ng0+ngw(w1w0)+ngt(t2t0),(10)

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    Δneff,rectangle=neff2neff1=neffwΔw+nefftΔt,(11)

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    Δneff,parallelogram=(neffwngtngw+nefft)Δt,when  ngtΔt<ngwΔw,(12)

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    Δneff,parallelogram=(neffwngwnefftngt)Δw,when  ngtΔt>ngwΔw.(13)

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    Δneff,rectangleΔneff,parallelogram=aΔwΔt+b,(16)

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    a=neffwneffwngt/ngw+nefft,b=nefftneffwngt/ngw+nefft.(17)

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    variationtotal=variationinter-die+variationlocation-dependent+variationlocal.(14)

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    Δneff,total=neffwΔwtotal+nefftΔttotal.(19)

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    Δneff,local=(neffwngtngw+nefft)Δtlocal.(20)

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    Δneff,total=neffwΔwtotal+nefftΔttotal=0.002055×40  nm+0.003916×20  nm=0.16.(21)

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    Δneff,intra-die=(neffwngtngw+nefft)Δtintra-die=0.0074×2=0.0148,(22)

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    Errorw=0.31+0.06=0.37  nm,Errort=0.18+0.08=0.26  nm.(23)

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    Yufei Xing, Jiaxing Dong, Sarvagya Dwivedi, Umar Khan, Wim Bogaerts. Accurate extraction of fabricated geometry using optical measurement[J]. Photonics Research, 2018, 6(11): 1008
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