Guodong Chen, Zinan Zhang, Sikun Li, Xiangzhao Wang. Study on Deep Ultraviolet Computational Lithography Techniques[J]. Laser & Optoelectronics Progress, 2022, 59(9): 0922007
- Laser & Optoelectronics Progress
- Vol. 59, Issue 9, 0922007 (2022)
![Typical optical proximity effects[9]](/richHtml/lop/2022/59/9/0922007/img_01.jpg)
Fig. 1. Typical optical proximity effects[9]
![Schematic of four correction rules[9]](/richHtml/lop/2022/59/9/0922007/img_02.jpg)
Fig. 2. Schematic of four correction rules[9]
![Schematic of the principles of EBOPC and PBOPC[42]](/Images/icon/loading.gif){kind=icon}
Fig. 3. Schematic of the principles of EBOPC and PBOPC[42]
Fig. 4. Imaging anomaly correction based on virtual edge[17]. (a) Horizontal extension anomaly; (b) horizontal shrinkage anomaly
Fig. 5. Imaging anomaly correction based on biphasic sampling[17]. (a) Shrinkage anomaly around the convex corner; (b) horizontal extension anomaly
Fig. 6. Schematic of the principle of SMO techniques[9]
Fig. 7. SMO results of different optimization algorithms[23]
Fig. 8. Schematic of the principle of ILT[42]
Fig. 9. Optimization flow of ILT based on block modulation overlapping and SRAF seed insertion[25]
Fig. 10. Strategies for pattern simplification during mask data preparation[119]
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