Author Affiliations
1Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016, China2School of Material Science and Engineering, University of Science and Technology of China, Hefei 230026, China3Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100190, China4Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, Chinashow less
Fig. 1. (Color online) (a, b) Typical spin valve devices made of graphene[33, 34]. (c) The performance of non-local magneto-resistance for CVD graphene spin valve with different channel lengths[34].
Fig. 2. (Color online) (a, b) Schematics of configurations for 2D spin valve devices, and (c) 2D spin filter tunnel junction (sf-TJ). (d–f) The first spin valve demonstrated using 2D vdW magnetic (Fe-doped TaS2) materials[94].
Fig. 3. (Color online) (a) Schematics of CrI3 sf-TJ[96]. (b–d) Optical images of several iterations of vdW 2D sf-TJ devices since 2017[96, 99, 106]. Notice that all of them have very small junction area possibly to reduce the number of magnetic domains. (e, f) The magneto-tunneling current and spin-filtered magnetoresistance for a four-layered CrI3 sf-TJ device[96].
Fig. 4. (Color online) Optical image of several versions of spin-FETs based on magnetic vdW materials (a) semiconducting CrSiTe3[62], (b) semiconducting Cr2Ge2Te6[110], (c) h-BN encapsulated Cr2Ge2Te6 (red and black dashed lines label the edge of Cr2Ge2Te6 and graphene electrodes, respectively)[15], and (d) Al2O3-assisted exfoliated 4-layered metallic Fe3GeTe2[17], respectively. Scale bars in (c) and (d) are 10 and 100 μm, respectively. (e) Schematic of the tunable Fermi level and simplified spin-polarized band structure of the vdW intrinsic magnetic semiconductor[15]. (f, g) Gate tuned magnetic hysteresis loops and gate-tuned I–V curves of the few-layered Cr2Ge2Te6 planar FET device[15]. (h, i) Longitudinal conductivity and Curie temperature of the Fe3GeTe2 planar FET as a function of ion liquid gate[17]. (j) The anomalous Hall curves of the ionic-gated Fe3GeTe2 planar FET at different temperatures[17].
Fig. 5. (Color online) (a, b) Schematic and optical image of a typical Pt/FGT device[124]. (c) Hall resistivity recorded as a function of current flowing in the 2D vdW heterostructure device. A hysteresis loop can be seen, demonstrating the current-driven magnetic switch of the magnetizations in the FGT layer[124]. (d) Switching current as a function of externally applied in-plane magnetic fields at different temperatures[124]. (e) Schematic structure of Pt/FGT device[125]. (f) Anomalous Hall effect curve of the Pt/FGT device[125]. (g) Current-induced magnetic switch at different external magnetic fields[125].
Fig. 6. (Color online) Illustration of different nanostructures for vdW spintronics.
Fig. 7. (Color online) A roadmap for the exfoliated spintronics.
Material | Bandgap | Magnetic orderings | Way to get | Measurement techniques | Exchange
interactions
| Critical temperature TC/TN | Tunability |
---|
CrI3[13, 14, 20, 63] | 1.2 eV | Intralayer/FM Interlayer/AFM FM/bulk | Exfoliated | Magneto-optic Kerr effect (MOKE) | Ising/direct
Double-exchange/
super-exchange
| 64 K/bulk 45 1L | Thickness
Gate/ionic liquid electric field
| CrBr3[21–23, 46] | 2.1 eV/bulk | FM/bulk FM/2D | HQ graphene provided/bulk Exfoliated/1L | Magnetic circular dichroism (MCD) | Heisenberg/direct | 35 K/bulk
37 K/3L 36/2L 27/1L
| Not available (NA) | CrCl3[24, 57, 64, 65] | 3.1 eV/bulk | Intralayer/FM Interlayer/AFM AFM/bulk | Chemical vapor transport(CVT)/bulk Exfoliated/2L | Tunneling | XY/direct | 14 K/bulk
17 K/few-layer 16/2L
| Thickness | Cr2Si2Te6[62, 66–69] | 0.4 eV/direct-bulk 1.2 eV/indirect/bulk | FM | Self-flux/bulk Exfoliated/2D | Heisenberg/direct
Double-exchange/
super-exchange
| 32 K/bulk
80 K/2D
| Thickness | Cr2Ge2Te6[15, 19] | 0.45 eV | FM | Exfoliated | MOKE | Heisenberg/direct | 45 K(bulk) | Gate/ionic liquid | Fe3GeTe2[17] | 0 | FM | A12O3 assisted exfoliated
| Anomalous Hall Effect (AHE) | Ising/direct
Itinerate/super-exchange
| 180 K/bulk
20 K/1L
| Thickness Ionic liquid | FePS3[25, 70] | 1.5 eV | AFM | CVT | Raman + DFT | Ising/direct | 123 K/bulk
118 K/1L
| NA | MnPS3[25, 26, 47] | 2.4 eV | AFM | CVT/bulk Exfoliated/2D | Physical property measurement systems (PPMS)/bulk Raman | Heisenberg/direct | 78 K/bulk | Liquid gating | NiPS3[27, 71] | 1.6 eV/indirect
>2.4 eV/direct
| AFM | CVT/bulk Exfoliated/2L | Raman | XY/direct | 155 K/bulk
130 K/2L
| NA | VSe2[17, 29] | 0 | FM/1L AFM/2L Paramagnetic/bulk | Molecular beam epitaxy(MBE) | MOKE AHE | NA | >300 K | Thickness
Electric field
| CrTe2[72] | 0 | FM | Oxidation of KCrTe2 | Squid | Itinerate/super-exchange | 310 K/bulk | NA | V5S8[30] | 0 | AFM/bulk FM/3.2 nm | Chemical Vapor Deposition (CVD)/10 nm Exfoliated/3.2 nm | AHE | NA | 32 K/bulk
2 K/3.2 nm
| Thickness | CrSe[31] | NA | FM | CVD | PPMS | NA | 208 K | NA | Cr2S3[32] | NA | FM | CVD | PPMS | NA | 120 K | NA |
|
Table 1. A list of typical 2D vdW magnetic materials and their magnetic fingerprints.