High-resolution X-ray flash radiography of Ti characteristic lines with multilayer Kirkpatrick–Baez microscope at the Shenguang-II Update laser facility

Shengzhen Yi; Feng Zhang; Qiushi Huang; Lai Wei; Yuqiu Gu; Zhanshan Wang

doi:10.1017/hpl.2021.30

Journals >High Power Laser Science and Engineering >Volume 9 >Issue 3 >Page 03000e42 > Article

High Power Laser Science and Engineering
Vol. 9, Issue 3, 03000e42 (2021)

High-resolution X-ray flash radiography of Ti characteristic lines with multilayer Kirkpatrick–Baez microscope at the Shenguang-II Update laser facility

Shengzhen Yi^1、2, Feng Zhang³, Qiushi Huang^1、2, Lai Wei³, Yuqiu Gu³, and Zhanshan Wang^1、2、*

Author Affiliations

¹MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University, Shanghai200092, China

²School of Physics Science and Engineering, Tongji University, Shanghai200092, China

³Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang621900, China

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DOI: 10.1017/hpl.2021.30 Cite this Article Set citation alerts

Shengzhen Yi, Feng Zhang, Qiushi Huang, Lai Wei, Yuqiu Gu, Zhanshan Wang. High-resolution X-ray flash radiography of Ti characteristic lines with multilayer Kirkpatrick–Baez microscope at the Shenguang-II Update laser facility[J]. High Power Laser Science and Engineering, 2021, 9(3): 03000e42 Copy Citation Text

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