• Journal of Semiconductors
  • Vol. 40, Issue 1, 012805 (2019)
Jianjun Shi, Xiaochuan Xia, Qasim Abbas, Jun Liu, Heqiu Zhang, Yang Liu, and Hongwei Liang
Author Affiliations
  • School of Microelectronics, Dalian University of Technology, Dalian 116024, China
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    DOI: 10.1088/1674-4926/40/1/012805 Cite this Article
    Jianjun Shi, Xiaochuan Xia, Qasim Abbas, Jun Liu, Heqiu Zhang, Yang Liu, Hongwei Liang. Current transport mechanism of Mg/Au ohmic contacts to lightly doped n-type β-Ga2O3[J]. Journal of Semiconductors, 2019, 40(1): 012805 Copy Citation Text show less

    Abstract

    The carrier transport mechanism of Mg/Au ohmic contact for lightly doped β-Ga2O3 is investigated. An excellent ohmic contact has been achieved when the sample was annealed at 400 °C and the specific contact resistance is 4.3 × 10-4 Ω·cm2. For the annealed sample, the temperature dependence of specific contact resistance is studied in the range from 300 to 375 K. The specific contact resistance is decreased from 4.3 × 10-4 to 1.59 × 10-4 Ω·cm2 with an increase of test temperature. As combination with the judge of E00, the basic mechanism of current transport is dominant by thermionic emission theory. The effective barrier height between Mg/Au and β-Ga2O3 is evaluated to be 0.1 eV for annealed sample by fitting experimental data with thermionic emission model.
    ${R_ {\rm{T}}} = 2{R_ {\rm{C}}} + \displaystyle\frac{{d{R_{\rm SH}}}}{W} = 2{R_ {\rm{C}}} + \frac{d}{{qN{\mu _ {\rm{n}}}S}}. $()

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    Jianjun Shi, Xiaochuan Xia, Qasim Abbas, Jun Liu, Heqiu Zhang, Yang Liu, Hongwei Liang. Current transport mechanism of Mg/Au ohmic contacts to lightly doped n-type β-Ga2O3[J]. Journal of Semiconductors, 2019, 40(1): 012805
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