• Journal of Semiconductors
  • Vol. 42, Issue 11, 114101 (2021)
Yuwei Cai1、2, Zhaohao Zhang1, Qingzhu Zhang1, Jinjuan Xiang1, Gaobo Xu1, Zhenhua Wu1, Jie Gu1、2, and Huaxiang Yin1
Author Affiliations
  • 1Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China
  • 2University of Chinese Academy of Sciences, Beijing 100049, China
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    DOI: 10.1088/1674-4926/42/11/114101 Cite this Article
    Yuwei Cai, Zhaohao Zhang, Qingzhu Zhang, Jinjuan Xiang, Gaobo Xu, Zhenhua Wu, Jie Gu, Huaxiang Yin. Investigation of time domain characteristics of negative capacitance FinFET by pulse-train approaches[J]. Journal of Semiconductors, 2021, 42(11): 114101 Copy Citation Text show less

    Abstract

    The HfO2-based ferroelectric field effect transistors (FeFET) have been widely studied for their ability in breaking the Boltzmann limit and the potential to be applied to low-power circuits. This article systematically investigates the transient response of negative capacitance (NC) fin field-effect transistors (FinFETs) through two kinds of self-built test schemes. By comparing the results with those of conventional FinFETs, we experimentally demonstrate that the on-current of the NC FinFET is not degraded in the MHz frequency domain. Further test results in the higher frequency domain show that the on-state current of the prepared NC FinFET increases with the decreasing gate pulse width at pulse widths below 100 ns and is consistently greater (about 80% with NC NMOS) than the on-state current of the conventional transistor, indicating the great potential of the NC FET for future high-frequency applications.
    $ {V}_{\rm{out}}={V}_{\rm{osc}}={V}_{\rm{DD}}-{I}_{\rm{DS}}{R}_{\rm{L}}. $()

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    $ {I}_{\rm{DS}}=\frac{{V}_{\rm{OSC}}}{{R}_{0}}. $()

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    Yuwei Cai, Zhaohao Zhang, Qingzhu Zhang, Jinjuan Xiang, Gaobo Xu, Zhenhua Wu, Jie Gu, Huaxiang Yin. Investigation of time domain characteristics of negative capacitance FinFET by pulse-train approaches[J]. Journal of Semiconductors, 2021, 42(11): 114101
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