• Journal of Semiconductors
  • Vol. 40, Issue 2, 022401 (2019)
Hong Guan1, Hao Sun2, Junlin Bao1, Zhipeng Wang2, Shuguang Zhou2, and Hongwei Zhu2
Author Affiliations
  • 1School of Microelectronics, Xidian University, Xi’an 710000, China
  • 2Semiconductor Manufacturing International Corporation, Shanghai 201203, China
  • show less
    DOI: 10.1088/1674-4926/40/2/022401 Cite this Article
    Hong Guan, Hao Sun, Junlin Bao, Zhipeng Wang, Shuguang Zhou, Hongwei Zhu. High-performance RF Switch in 0.13 μm RF SOI process[J]. Journal of Semiconductors, 2019, 40(2): 022401 Copy Citation Text show less

    Abstract

    A high-performance single-pole single-throw (SPST) RF switch for mobile phone RF front-end modules (FEMs) was designed and characterized in a 0.13 μm partially depleted silicon-on-insulator (PD SOI) process. In this paper, the traditional series-shunt configuration design was improved by introducing a suitably large DC bias resistor and leakage-preventing PMOS, together with the floating body technique. The performance of the RF switch is greatly improved. Furthermore, a new Ron × Coff testing method is also proposed. The size of this SPST RF switch is 0.2 mm2. This switch can be widely used for present 4G and forthcoming 5G mobile phone FEMs.
    $ {{{R}}_ {\rm{on}}}\left( {{\rm{ \Omega}}/{ \mu {\rm m}}} \right) = \frac{{{V_ {\rm{d}}}}}{{{I_ {\rm{din}}}}}\left( {I_ {\rm{din}} = \frac{{{{{I}}}}_ {\rm{d}}}{{{W}}}} \right) , $ (1)

    View in Article

    ${C_ {\rm{off}}}\left( {{\rm fF}/ \mu {\rm m}} \right) = \frac{1}{2}{C_ {\rm{ov}}} + {C_j},$ (2)

    View in Article

    ${\rm{FOM}}\left( {{\rm{fs}}} \right) = {{{R}}_ {\rm{on}}}{C_ {\rm{off}}}.$ (3)

    View in Article

    ${\rm IL} = - 20\log \frac{{{R_ {\rm{o}}}}}{{2{R_0} + {R_ {\rm{on}}}}},$(4)

    View in Article

    ${\rm ISO} = - 10\log \frac{{2{R_0}}}{{2{R_0} + \frac{2}{{\omega {C_ {\rm{off}}}}}}}.$(5)

    View in Article

    ${P_ {\rm{watt}}} = {10^{\frac{{35}}{{10}}}}\times0.001 = 3.16\;{\rm W},$(6)

    View in Article

    ${V_ {\rm{peak}}} = \sqrt {2{P_ {\rm{watt}}}{Z_0}} = 17.8\;{\rm V},$(7)

    View in Article

    ${V_{\max }} = {V_ {\rm{peak}}}\left(1 + \frac{{\rm VSWR - 1}}{{\rm VSWR + 1}}\right) = 28.5\;{\rm V}.$(8)

    View in Article

    Hong Guan, Hao Sun, Junlin Bao, Zhipeng Wang, Shuguang Zhou, Hongwei Zhu. High-performance RF Switch in 0.13 μm RF SOI process[J]. Journal of Semiconductors, 2019, 40(2): 022401
    Download Citation