• Journal of Semiconductors
  • Vol. 40, Issue 12, 122802 (2019)
Mussaab I. Niass1、2、3, Muhammad Nawaz Sharif1、2、3, Yifu Wang1、2、3, Zhengqian Lu1、2、3, Xue Chen1、2、3, Yipu Qu1、2、3, Zhongqiu Du1、2、3, Fang Wang1、2、3, and Yuhuai Liu1、2、3
Author Affiliations
  • 1National Center for International Joint Research of Electronic Materials and Systems, Zhengzhou 450001, China
  • 2International Joint-Laboratory of Electronic Materials and Systems of Henan Province, Zhengzhou 450001, China
  • 3Department of Electronics and Information Engineering, School of Information Engineering, Zhengzhou University, Zhengzhou 450001, China
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    DOI: 10.1088/1674-4926/40/12/122802 Cite this Article
    Mussaab I. Niass, Muhammad Nawaz Sharif, Yifu Wang, Zhengqian Lu, Xue Chen, Yipu Qu, Zhongqiu Du, Fang Wang, Yuhuai Liu. A contrivance of 277 nm DUV LD with B0.313Ga0.687N/B0.40Ga0.60N QWs and AlxGa1–xN heterojunction grown on AlN substrate[J]. Journal of Semiconductors, 2019, 40(12): 122802 Copy Citation Text show less
    References

    [1] D B Li, n X J Sun, o C L Guo. AlGaN photonics: recent advances in materials and ultraviolet devices. Adv Opt Photon, 10, 43(2018).

    [2] M Z Chowdhury, n M T Hossan, m A Islam et al. A comparative survey of optical wireless technologies: architectures and applications. IEEE Access, 6, 9819(2018).

    [3] J R Chen, o T S Ko, u P Y Su et al. Numerical study on optimization of active layer structures for GaN/AlGaN multiple-quantum-well laser diodes. J Lightwave Technol, 26, 3155(2008).

    [4] T Watanabe, a T Niiyama, a K Miya et al. Far-ultraviolet plane-emission handheld device based on hexagonal boron nitride. Nat Photonics, 3, 591(2009).

    [5] K Watanabe, i T Taniguchi. Hexagonal boron nitride as a new ultraviolet luminescent material and its application. Int J Appl Ceram Technol, 8, 977(2011).

    [6] H Kawanishi, a M Haruyama, i T Shirai et al. (BAlGa)N quaternary system and epitaxial growth on (0001) 6H-SiC substrate by low-pressure MO-VPE. Proc SPIE, 2994, 52(1997).

    [7] M Kurimoto, o T Takano, o J Yamamoto et al. Growth of BGaN/AlGaN multi-quantum-well structure by metalorganic vapor phase epitaxy. J Cryst Growth, 221, 378(2000).

    [8] T Honda, o M Kurimoto, M Shibata et al. Excitonic emission of BGaN grown on (0 0 0 1) 6H-SiC by metal-organic vapor-phase epitaxy. J Lumin, 87–89, 1274(2000).

    [9] J L R Dahal, y S Majety, a B N Pantha et al. Epitaxially grown semiconducting hexagonal boron nitride as a deep ultraviolet photonic materia. Appl Phys Lett, 98, 211110(2011).

    [10] J L S Majety, o X K Cao, l R Dahal et al. Epitaxial growth and demonstration of hexagonal BN/AlGaN p–n junctions for deep ultraviolet photonics. Appl Phys Lett, 100, 061121(2012).

    [11] H X Jiang, J Y. Lin. Hexagonal boron nitride for deep ultraviolet photonic devices. Semicond Sci Technol, 29, 1(2014).

    [12] M M Satter, m H J Kim, Z Lochner et al. Design and analysis of 250-nm AlInN laser diodes on AlN substrates using tapered electron blocking layers. IEEE J Quantum Electron, 48, 703(2012).

    [13] L Sailo, e R L Ralte, i M Lalchhuanawmi et al. Calculation of the band structure and band splitting energy of boron compounds (BX, X = N, P, As, Sb) using modified Becke-Johnson potential. IOSR-JAP, 8, 1(2016).

    Mussaab I. Niass, Muhammad Nawaz Sharif, Yifu Wang, Zhengqian Lu, Xue Chen, Yipu Qu, Zhongqiu Du, Fang Wang, Yuhuai Liu. A contrivance of 277 nm DUV LD with B0.313Ga0.687N/B0.40Ga0.60N QWs and AlxGa1–xN heterojunction grown on AlN substrate[J]. Journal of Semiconductors, 2019, 40(12): 122802
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