Development of Extreme Ultraviolet Photoresists

Xudong Guo; Guoqiang Yang; Yi Li

doi:10.3788/LOP202259.0922004

Journals >Laser & Optoelectronics Progress >Volume 59 >Issue 9 >Page 0922004 > Article

Laser & Optoelectronics Progress
Vol. 59, Issue 9, 0922004 (2022)

Development of Extreme Ultraviolet Photoresists

Xudong Guo^1、3、†, Guoqiang Yang^{1、3、†,*}, and Yi Li^2、3

Author Affiliations

¹Key Laboratory of Photochemistry, Chinese Academy of Sciences, Beijing National Laboratory for Molecular Sciences, Beijing 100190, China

²Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190, China

³University of Chinese Academy of Sciences, Beijing 100039, China

show less

DOI: 10.3788/LOP202259.0922004 Cite this Article Set citation alerts

Xudong Guo, Guoqiang Yang, Yi Li. Development of Extreme Ultraviolet Photoresists[J]. Laser & Optoelectronics Progress, 2022, 59(9): 0922004 Copy Citation Text

show less

Cited By

Article index updated: May. 30, 2024

Citation counts are provided from Researching.

The article is cited by 2 article(s) from Researching.