STM | High spatial resolution; morphology and electronic structure analysis | Limited to conductive samples, requires ultra-high vacuum | Surface morphology, electronic structure analysis |
SEM | High depth of field, for conductive and non-conductive samples | Lower resolution than STM, sample preparation challenges | Morphology analysis of various samples |
AFM | High resolution in both lateral and vertical directions | Relatively slow imaging, tip wear and contamination effects | Surface morphology analysis, material property studies |
LEEM | High spatial resolution, real-time imaging of surface dynamics | Limited to conductive samples, complex instrumentation | Surface morphology analysis, real-time imaging |
RHEED | Real-time monitoring, provides crystal structure information | Limited to conducting samples, surface sensitivity variability | Thin-film growth monitoring, surface structure determination |
LEED | High sensitivity for surface structure determination | Requires ultra-high vacuum, limited to ordered surfaces | Crystallography studies, surface structure analysis |
GIFAD | Provides structural information for surfaces | Limited to specific incident angles, complex instrumentation | Surface structure analysis, studies of ordered surfaces |
NFS | Nondestructive, element-specific, sensitive to vibrations | For certain isotopes, relatively low scattering cross section | Study of vibrational dynamics, element-specific analysis |
RAS | Real-time monitoring, sensitive to surface changes | Requires careful data analysis, limited to specific materials | Monitoring of surface processes, surface structure analysis |
XRS | Provides atomic arrangement information in crystals | Requires a crystalline sample, limited to periodic structures | Crystallography studies |
XRD | High precision in determining crystal structures | For crystalline samples, bulk analysis lack surface specificity | Crystallography studies, analysis of crystalline materials |
RSM | Detailed information on crystal lattice parameters | Requires crystalline samples, complex instrumentation | Strain analysis, determination of crystal lattice parameters |
XANES | Provides local electronic structure information | For elements with absorption edges in the X-ray range | Study of local electronic structure in various materials |
RS | Nondestructive, applicable to a wide range of materials | Low spatial resolution, susceptibility to fluorescence interference | molecular structures analysis |
SE | High sensitivity, nondestructive | Requires accurate modeling, limited to certain sample types | Film thickness and optical constant determination |
STM/STS | Provides electronic structure, density of states information | Limited to conductive samples, sample preparation challenges | Surface electronic structure, density of states analysis |
QMS | High sensitivity to mass changes, real-time analysis | Limited to gas-phase analysis, may require sample ionization | Gas composition analysis |
DMS | Provides real-time information on desorbed species analysis | Limited to studying desorption phenomena, sample-dependent | Surface desorption analysis, study of desorption processes |
PES | High surface sensitivity, elemental composition analysis | Requires ultra-high vacuum, limited to surface analysis | Surface composition analysis, chemical state determination |
XPS | Surface-sensitive for elemental composition analysis | Limited depth of analysis, sample charging affect results | Surface composition analysis, chemical state determination |
UPS | Provides information about valence band, surface-sensitive | Requires ultra-high vacuum, limited to surface analysis | Valence band electronic structure analysis, surface chemical analysis |
ARPES | Provides detailed information about electronic band structure | Requires ultra-high vacuum, limited to surface analysis | Electronic band structure analysis, surface electronic states |
CEMS | Provides information on chemical environment, Mössbauer-active nuclei | Limited to specific isotopes, requires cryogenic temperatures | Study of chemical environments, Mössbauer-active nuclei analysis |
MOKE | Sensitive to magnetic properties and domain structures | Limited to magnetic materials, complex instrumentation | Magnetic domain structure, magnetic properties analysis |
XAS | Provides information on local electronic and geometric structure | Requires synchrotron radiation, complex data analysis | Local electronic and geometric structure analysis |
XPD | Provides structural information at the atomic level, surface-sensitive | Requires ultra-high vacuum, limited to surface analysis | Surface structural analysis, study of atomic arrangement |
AES | Elemental and chemical state analysis of surfaces, high sensitivity | Limited depth of analysis, surface sensitivity | Surface composition analysis, chemical state determination |
EELS | Provides information on electronic excitations and bonding, high spatial resolution | Requires sophisticated instrumentation, complex data analysis | Electronic structure analysis, study of electronic excitations |
AIPES | Provides angle-integrated information on electronic structure | Limited to angle-integrated data, lack angular information | Electronic structure analysis, study of electronic states |
CM | Measures surface curvature, provides strain information | Limited to surface properties | Strain analysis, characterization of curved surfaces |
MOS | Simultaneous measurement of multiple parameters | System complexity may require careful calibration | Multifaceted parameter monitoring, simultaneous data acquisition |
4PC | Accurate measurement of electrical conductivity | Requires precise sample preparation | Electrical conductivity analysis, study of conductive materials |
BEM | Monitors changes in band structure during processes | Specific to semiconductor materials, requires precise control of growth conditions | Real-time monitoring of band structure changes during thin-film growth |
XPEEM | Combines high-resolution imaging with surface-sensitive spectroscopy | Requires ultra-high vacuum conditions, limited to surface analysis | Surface chemical composition analysis, electronic structure imaging |
CL | Probes luminescent properties of materials under electron beam excitation | Limited to materials with luminescent properties, resolution may be limited | Study of bandgap, defects, and luminescent properties of materials |
XMCD | Sensitive to magnetic properties and magnetic moments of elements | Requires synchrotron radiation for high-quality data, limited to magnetic materials | Study of magnetic properties, magnetic moment determination |
DRS | Sensitive to changes in the optical properties of materials | Data analysis may require careful consideration of multiple factors | Monitoring changes in optical properties, surface and interface analysis |