Post-treatment of 351 nm SiO2 antireflective coatings for high power laser systems prepared by the sol-gel method

Bin Shen; Huai Xiong; Xu Zhang; Zhiya Chen; Xiangyang Pang; Yajing Guo; Chengjie Liang; Haiyuan Li

doi:10.3788/COL202220.011601

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