Post-treatment of 351 nm SiO2 antireflective coatings for high power laser systems prepared by the sol-gel method

Bin Shen; Huai Xiong; Xu Zhang; Zhiya Chen; Xiangyang Pang; Yajing Guo; Chengjie Liang; Haiyuan Li

doi:10.3788/COL202220.011601

Journals >Chinese Optics Letters >Volume 20 >Issue 1 >Page 011601 > Article

Chinese Optics Letters
Vol. 20, Issue 1, 011601 (2022)

Post-treatment of 351 nm SiO₂ antireflective coatings for high power laser systems prepared by the sol-gel method

Bin Shen^1、*, Huai Xiong^1、**, Xu Zhang¹, Zhiya Chen¹, Xiangyang Pang¹, Yajing Guo¹, Chengjie Liang^1、2, and Haiyuan Li¹

Author Affiliations

¹Key Laboratory of High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

²Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

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DOI: 10.3788/COL202220.011601 Cite this Article Set citation alerts

Bin Shen, Huai Xiong, Xu Zhang, Zhiya Chen, Xiangyang Pang, Yajing Guo, Chengjie Liang, Haiyuan Li. Post-treatment of 351 nm SiO₂ antireflective coatings for high power laser systems prepared by the sol-gel method[J]. Chinese Optics Letters, 2022, 20(1): 011601 Copy Citation Text

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