Jun Qiu, Guanghua Yang, Jing Li, Zengxiong Lu, Minxia Ding. Development and Challenges of Lithographical Alignment Technologies[J]. Acta Optica Sinica, 2023, 43(19): 1900001
- Acta Optica Sinica
- Vol. 43, Issue 19, 1900001 (2023)
Fig. 1. Evolution route of alignment technologies of ASML, Nikon, and Canon
![Schematic diagram of phase grating alignment (PGA) method[39]](/richHtml/gxxb/2023/43/19/1900001/img_02.jpg)
Fig. 2. Schematic diagram of phase grating alignment (PGA) method[39]
![Schematic diagram of TTL alignment technology[41]](/Images/icon/loading.gif){kind=icon}
Fig. 3. Schematic diagram of TTL alignment technology[41]
Fig. 4. Schematic diagram of XPA mark composed of four gratings[43]
Fig. 5. Curve of normalized ±1 order diffraction light alignment signal strength versus slot depth in TTL alignment technology［14］
Fig. 6. Schematic diagram of ATHENA[45]
Fig. 7. Schematic diagram of diffraction stage separation in ATHENA[40]
Fig. 8. Curve of normalized ±1-±7 order diffraction light alignment signal strength versus slot depth in ATHENA[14,47]. (a) Normalized alignment signal strength corresponding to each wavelength; (b) maximum normalized alignment signal strength
Fig. 9. Schematic diagram of ATHENA mark[43]
Fig. 10. Schematic diagram of SPM mark improvement［3］. (a) Schematic diagram of SSPM-X mark (Image rotated by 90° is SSPM-Y mark); (b) schematic diagram of NSSM-X mark (Image rotated by 90° is NSSM-Y mark)
Fig. 12. Schematic diagram of interferometer module structure in SMASH[53]
Fig. 13. Schematic diagram of SMASH mark[3]
Fig. 15. Flow chart of D4C software design marking[57]
Fig. 16. Type of mark and segmented method[61]. (a) Unsegmented mark; (b) scan direction segmented mark; (c) non-scan direction segmented mark; (d) scan direction and non-scan direction segmented marks; (e) inclined segmented mark
Fig. 17. Mark asymmetric deformation resulting in position error[57]. (a) Schematic diagram of marking symmetry; (b) schematic diagram of marking asymmetry
Fig. 18. Schematic diagram of OCW method[63]
Fig. 20. Schematic diagram of LSA. (a) Three-dimensional diagram[23] ; (b) schematic diagram of X direction[24]
Fig. 21. LSA mark[24]. (a) Search mark-X; (b) search mark-Y; (c) EGA mark-X; (d) EGA mark-Y
Fig. 22. Schematic diagram of FIA[22]
Fig. 23. FIA mark[73]. (a) Search mark; (b) EGA mark
Fig. 24. Schematic diagram of LIA[22]
Fig. 25. Schematic diagram of TTL alignment technology[31]
Fig. 26. Schematic diagram of TTL alignment mark[31]
Fig. 27. Schematic diagram of OAL for single stage lithography machine[34]
Fig. 29. Multi grating alignment system[79]. (a) Structure diagram of alignment system; (b) structure diagram of alignment mark
Fig. 30. Reflection-style alignment optical path based on Moiré fringes[16]
Fig. 31. Four-quadrant gratings Moiré fringe alignment mark[81]. (a) Silicon wafer grating mark; (b) mask grating mark
Fig. 32. Simultaneous multi-channel absolute position alignment by multi-order grating interferometry[89]
Fig. 33. Principle diagram of self-coherence Moiré fringe alignment technology[21]
Fig. 34. Comparison diagram of diffraction efficiency of each mark[92]. (a) AH11; (b) AH53; (c) IME3; (d) IME5
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Table 1. Characteristics of alignment technologies of ASML, Nikon, and Canon
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Table 2. Characteristic of alignment marks of ASML, Nikon, and Canon
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Table 3. Parameter characteristics of ASML alignment technologies
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Table 4. Parameter characteristics of Nikon alignment technologies
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