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    Journals >Acta Optica Sinica >Volume 43 >Issue 19 >Page 1900001 > Article
    • Acta Optica Sinica
    • Vol. 43, Issue 19, 1900001 (2023)
    Development and Challenges of Lithographical Alignment Technologies
    Jun Qiu1,2, Guanghua Yang1, Jing Li1,2,*, Zengxiong Lu1,2, and Minxia Ding1
    Author Affiliations
  • 1Institute of Microelectronics of the Chinese Academy of Sciences, Beijing 100029, China
  • 2University of Chinese Academy of Sciences, Beijing 100049, China
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    DOI: 10.3788/AOS230637 Cite this Article Set citation alerts
    Jun Qiu, Guanghua Yang, Jing Li, Zengxiong Lu, Minxia Ding. Development and Challenges of Lithographical Alignment Technologies[J]. Acta Optica Sinica, 2023, 43(19): 1900001 Copy Citation Text show less
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    Article index updated: Jun. 5, 2025
    The article is cited by 4 article(s) CLP online library. (Some content might be in Chinese.)
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    Jun Qiu, Guanghua Yang, Jing Li, Zengxiong Lu, Minxia Ding. Development and Challenges of Lithographical Alignment Technologies[J]. Acta Optica Sinica, 2023, 43(19): 1900001
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    Paper Information
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