• Journal of Semiconductors
  • Vol. 40, Issue 10, 102801 (2019)
Li Zhang, Haitao Qi, Hongjuan Cheng, Lei Jin, and Yuezeng Shi
Author Affiliations
  • China Electronics Technology Group Corp 46th Research Institute, Tianjin 300220, China
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    DOI: 10.1088/1674-4926/40/10/102801 Cite this Article
    Li Zhang, Haitao Qi, Hongjuan Cheng, Lei Jin, Yuezeng Shi. Preparation and characterization of AlN seeds for homogeneous growth[J]. Journal of Semiconductors, 2019, 40(10): 102801 Copy Citation Text show less
    References

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    [7] H I Helava, E N Mokhov, O A Avdeev et al. Growth of low-defect SiC and AlN crystals in refractory metal crucibles. Mater Sci Forum, 740–742, 85(2013).

    [8] R R Sumathi, M Paun. Growth of (0001) AlN single crystals using carbon-face SiC as seeds. Mater Sci Forum, 740–742, 99(2013).

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    [15] R Dalmau, H S Craft, J Britt et al. High quality AlN single crystal substrates for AlGaN-based devices. Mater Sci Forum, 924, 923(2018).

    [16] R R Sumathi, R U Barz, T Straubinger et al. Structural and surface topography analysis of AlN single crystals grown on 6H–SiC substrates. J Cryst Growth, 360, 193(2012).

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    [18] I Nagai, T Kato, T Miura et al. AlN bulk single crystal growth on 6H-SiC substrates by sublimation method. J Cryst Growth, 312, 2699(2010).

    Li Zhang, Haitao Qi, Hongjuan Cheng, Lei Jin, Yuezeng Shi. Preparation and characterization of AlN seeds for homogeneous growth[J]. Journal of Semiconductors, 2019, 40(10): 102801
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