Jun Cheng, Nan Yan. Three-step lithography to the fabrication of vertically coupled micro-ring resonators in amorphous silicon-on-insulator[J]. Chinese Optics Letters, 2015, 13(8): 082201
- Chinese Optics Letters
- Vol. 13, Issue 8, 082201 (2015)
Fig. 1. Vertically coupled micro-ring resonators. (a) Four-port and (b) two-port configurations.
Fig. 2. Characterization of the material properties. (a) The FTIR spectrum. (b) The IR camera image of loss streak from a 200 nm a-Si:H wafer. (c) The data extracted from this image fitted with a linear decay.
Fig. 3. Whole lithography processes.
Fig. 4. Ma-N 2405 dose testing result.
Fig. 5. Optical microscopy picture of the first layer of a two-port ring resonator.
Fig. 6. Scanning electron microscope pictures of straight waveguide, mark, and first layer of four-port racetrack resonator after etching.
Fig. 7. Optical microscopy photograph of windows pattern on bottom marks after development.
Fig. 8. Micro-ring resonator testing result.
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Table 1. Hydrogenated Amorphous Silicon Deposition Conditions
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Table 2. Su-8 Coating and Etching Conditions
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