• Laser & Optoelectronics Progress
  • Vol. 57, Issue 15, 153101 (2020)
Dongmei Liu1, Pengfei Yue1、*, Xiuhua Fu1, Hongyu Cao1, Jing Zhang1, and Shuang Li2
Author Affiliations
  • 1School of Optoelectronic Engineering, Changchun University of Science and Technology, Changchun, Jilin 130022, China
  • 2Optorun (shanghai) Co., Ltd., Shanghai 200444, China
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    DOI: 10.3788/LOP57.153101 Cite this Article Set citation alerts
    Dongmei Liu, Pengfei Yue, Xiuhua Fu, Hongyu Cao, Jing Zhang, Shuang Li. Preparation of SixNy/SiO2 Hard Antireflection Film in Visible Light Band[J]. Laser & Optoelectronics Progress, 2020, 57(15): 153101 Copy Citation Text show less
    Diagram of effective interface method
    Fig. 1. Diagram of effective interface method
    Refractive index of two materials. (a) SiO2; (b) SixNy
    Fig. 2. Refractive index of two materials. (a) SiO2; (b) SixNy
    Single-sided reflectivity test curves under different N2 gas flow
    Fig. 3. Single-sided reflectivity test curves under different N2 gas flow
    Sensitivity distribution of the film
    Fig. 4. Sensitivity distribution of the film
    Comparison of design and test curves
    Fig. 5. Comparison of design and test curves
    Extinction coefficient of SixNy monolayer film
    Fig. 6. Extinction coefficient of SixNy monolayer film
    MaterialTG1/2-SiICP*2
    Power /kWAr /sccmPower /kWAr /sccmO2 /sccmN2 /sccm
    SixNy122005800100
    SiO2121005802200
    Table 1. Process parameters
    SampleP /%Hardness /GPa
    131.757.88
    246.189.13
    374.2815.12
    Table 2. Hardness of different samples
    Gas flow /sccmHardness /GPa
    7517.93
    10018.58
    12520.36
    15020.95
    17520.77
    20018.71
    Table 3. SixNy film hardness under different N2 inflation
    MaterialTG1/2-SiICP*2
    Power /kWAr /sccmPower /kWAr /sccmO2 /sccmN2 /sccm
    SixNy122005800125-175
    SiO2121005802200
    Table 4. Process parameters of N2 gradient test
    SampleGas flow /sccmHardness /GPa
    512515.99
    615016.06
    717515.42
    Table 5. Film hardness under different N2 inflation
    Layer number1234567891011
    MaterialSiO2SixNySiO2SixNySiO2SixNySiO2SixNySiO2SixNySiO2
    Thickness /nm7.9715.6638.8144.0112.6482.008.00180.008.00148.4887.34
    Table 6. Actual physical thickness of each film after adjustment
    Dongmei Liu, Pengfei Yue, Xiuhua Fu, Hongyu Cao, Jing Zhang, Shuang Li. Preparation of SixNy/SiO2 Hard Antireflection Film in Visible Light Band[J]. Laser & Optoelectronics Progress, 2020, 57(15): 153101
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