Preparation of SixNy/SiO2 Hard Antireflection Film in Visible Light Band

Dongmei Liu; Pengfei Yue; Xiuhua Fu; Hongyu Cao; Jing Zhang; Shuang Li

doi:10.3788/LOP57.153101

Journals >Laser & Optoelectronics Progress >Volume 57 >Issue 15 >Page 153101 > Article

Laser & Optoelectronics Progress
Vol. 57, Issue 15, 153101 (2020)

Preparation of Si_xN_y/SiO₂ Hard Antireflection Film in Visible Light Band

Dongmei Liu¹, Pengfei Yue^1、*, Xiuhua Fu¹, Hongyu Cao¹, Jing Zhang¹, and Shuang Li²

Author Affiliations

¹School of Optoelectronic Engineering, Changchun University of Science and Technology, Changchun, Jilin 130022, China

²Optorun (shanghai) Co., Ltd., Shanghai 200444, China

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DOI: 10.3788/LOP57.153101 Cite this Article Set citation alerts

Dongmei Liu, Pengfei Yue, Xiuhua Fu, Hongyu Cao, Jing Zhang, Shuang Li. Preparation of Si_xN_y/SiO₂ Hard Antireflection Film in Visible Light Band[J]. Laser & Optoelectronics Progress, 2020, 57(15): 153101 Copy Citation Text

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