• Laser & Optoelectronics Progress
  • Vol. 57, Issue 15, 153101 (2020)
Dongmei Liu1, Pengfei Yue1、*, Xiuhua Fu1, Hongyu Cao1, Jing Zhang1, and Shuang Li2
Author Affiliations
  • 1School of Optoelectronic Engineering, Changchun University of Science and Technology, Changchun, Jilin 130022, China
  • 2Optorun (shanghai) Co., Ltd., Shanghai 200444, China
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    DOI: 10.3788/LOP57.153101 Cite this Article Set citation alerts
    Dongmei Liu, Pengfei Yue, Xiuhua Fu, Hongyu Cao, Jing Zhang, Shuang Li. Preparation of SixNy/SiO2 Hard Antireflection Film in Visible Light Band[J]. Laser & Optoelectronics Progress, 2020, 57(15): 153101 Copy Citation Text show less

    Abstract

    To improve the anti-friction and anti-scratch ability of the mobile phone display screen and reduce the risk of display screen breakage, a hard antireflection film in visible light band has been prepared in this paper. By gradually increasing the proportion of the thickness of the SixNy film in the total thickness, the deposition process is optimized and the film hardness is improved. According to the design theory of antireflection coating, reasonable film grouping mode and reverse inversion analysis method, the film system design is completed, and the reflectivity of the film is reduced. Testing results show that the average reflectivity of the film is 0.58% and the hardness is 15.99 GPa.
    Dongmei Liu, Pengfei Yue, Xiuhua Fu, Hongyu Cao, Jing Zhang, Shuang Li. Preparation of SixNy/SiO2 Hard Antireflection Film in Visible Light Band[J]. Laser & Optoelectronics Progress, 2020, 57(15): 153101
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