• Journal of Semiconductors
  • Vol. 41, Issue 7, 072903 (2020)
Hailong Wang1、2, Jialin Ma1、2, Qiqi Wei1、2, and Jianhua Zhao1、2、3
Author Affiliations
  • 1State Key Laboratory of Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
  • 2Center of Materials Science and Optoelectronics Engineering & CAS Center for Excellence in Topological Quantum Computation, University of Chinese Academy of Sciences, Beijing 100190, China
  • 3Beijing Academy of Quantum Information Sciences, Beijing 100193, China
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    DOI: 10.1088/1674-4926/41/7/072903 Cite this Article
    Hailong Wang, Jialin Ma, Qiqi Wei, Jianhua Zhao. Mn doping effects on the gate-tunable transport properties of Cd3As2 films epitaxied on GaAs[J]. Journal of Semiconductors, 2020, 41(7): 072903 Copy Citation Text show less

    Abstract

    The Mn doping effects on the gate-tunable transport properties of topological Dirac semimetal Cd3As2 films have been investigated. Mn-doped Cd3As2 films are directly grown on GaAs(111)B substrates by molecular-beam epitaxy, during which the single crystal phase can be obtained with Mn concentration less than 2%. Shubnikov-de Haas oscillation and quantum Hall effect are observed at low temperatures, and electrons are found to be the dominant carrier in the whole temperature range. Higher Mn content results in smaller lattice constant, lower electron mobility and larger effective band gap, while the carrier density seems to be unaffected by Mn-doping. Gating experiments show that Shubnikov-de Haas oscillation and quantum Hall effect are slightly modulated by electric field, which can be explained by the variation of electron density. Our results provide useful information for understanding the magnetic element doping effects on the transport properties of Cd3As2 films.
    $\rho = A\exp \left( {{E_{\rm{a}}}/{k_{\rm{B}}}T} \right),$()

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    Hailong Wang, Jialin Ma, Qiqi Wei, Jianhua Zhao. Mn doping effects on the gate-tunable transport properties of Cd3As2 films epitaxied on GaAs[J]. Journal of Semiconductors, 2020, 41(7): 072903
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