Yi Zhang, Cheng'ao Yang, Jinming Shang, Yihang Chen, Tianfang Wang, Yu Zhang, Yingqiang Xu, Bing Liu, Zhichuan Niu. Research Progress of Semiconductor Interband Cascade Lasers[J]. Acta Optica Sinica, 2021, 41(1): 0114004
- Acta Optica Sinica
- Vol. 41, Issue 1, 0114004 (2021)
![Absorption peaks of various gases[8]](/richHtml/gxxb/2021/41/1/0114004/img_1.jpg)
Fig. 1. Absorption peaks of various gases[8]
![Energy band diagram of quantum well cascade laser[39]](/richHtml/gxxb/2021/41/1/0114004/img_2.jpg)
Fig. 2. Energy band diagram of quantum well cascade laser[39]
![Conduction band and energy level of 3 μm QCL[59]](/Images/icon/loading.gif){kind=icon}
Fig. 3. Conduction band and energy level of 3 μm QCL[59]
Fig. 4. Energy band diagram of active region of early time ICL[64]
Fig. 5. Energy band diagram of active region of ICL[102]
Fig. 6. Current-output power curves for the ICL of NRL[115]
Fig. 7. Emission spectra for the ICL of NRL[115]
Fig. 8. Full structure diagram of the interband cascade laser[61]
Fig. 9. Energy band diagram of interband cascade laser with transition layer[109]
Fig. 10. Energy band diagram of cascade region of ICL[61]
Fig. 11. Energy gap, energy band edge, and lattice constant of InAs, GaSb, and AlSb[120]
Fig. 12. Relationship between threshold current and temperature for short injection zone design[109]
Fig. 13. Energy band and carrier distributions of rebalancing of carriers[102]. (a) Electron injection zone with medium doping concentration of 4×1017 cm-3; (b) electron injection zone with heavy doping concentration of 5×1018 cm-3
Fig. 14. Refractive index and optical TE mode distribution of SCL at 800 nm in 7 cascade regions[115]
Fig. 15. Optical confinement factor for active region, waveguide cladding, separate confinement layers, and transition layer[115]
Fig. 16. 10 μm×10 μm atomic force microscope photo of interband cascade laser[61]
Fig. 17. HR-XRD[004] diffraction curve of ICL[61]
Fig. 18. SEM sidewall topography of an interband cascade laser with seven cascade cycles. (a) Methane-based etching;(b) BCl3-based etching[126]
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